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Volumn 442, Issue 1-2, 1998, Pages 207-216

Electrochemistry at boron-doped diamond films grown on graphite substrates: Redox-, adsorption and deposition processes

(8) Goeting, Christiaan H a Jones, Frances a Foord, John S a Eklund, John C a Marken, Frank a Compton, Richard G a Chalker, Paul R b Johnston, Colin b,c

a UNIVERSITY OF OXFORD (United Kingdom)

b Harwell Lab (United Kingdom)

c UNIVERSITY OF LIVERPOOL (United Kingdom)

Author keywords

CVD; Diamond electrode; Diamond film; Graphite substrate; Pb deposition

Indexed keywords

ADSORPTION; ATOMIC FORCE MICROSCOPY; BORON; CYCLIC VOLTAMMETRY; DOPING (ADDITIVES); ELECTROCHEMISTRY; GRAPHITE; RAMAN SPECTROSCOPY; REDOX REACTIONS; RUTHENIUM COMPOUNDS; SCANNING ELECTRON MICROSCOPY; VAPOR DEPOSITION;

MICROWAVE ASSISTED VAPOR DEPOSITION;

DIAMOND FILMS;

EID: 0031678986 PISSN: 15726657 EISSN: None Source Type: Journal
DOI: 10.1016/S0022-0728(97)00456-7 Document Type: Article

Times cited : (77)

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