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Volumn 108, Issue 10, 2008, Pages 1120-1123
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Pushing the boundaries of local oxidation nanolithography: Short timescales and high speeds
a
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Author keywords
Atomic force microscopy; Local oxidation; Nanofabrication
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Indexed keywords
ATOMIC FORCE MICROSCOPY;
CHEMICAL OXYGEN DEMAND;
ELECTRON BEAM LITHOGRAPHY;
HYDROGEN;
MICROSCOPIC EXAMINATION;
NANOLITHOGRAPHY;
NANOTECHNOLOGY;
NONMETALS;
OPTICAL DESIGN;
OXIDATION;
PASSIVATION;
SCANNING PROBE MICROSCOPY;
SILICON;
THROUGHPUT;
CONTACT MODE ATOMIC FORCE MICROSCOPY;
HIGH SPEEDS;
HIGH THROUGHPUTS;
LOCAL OXIDATION;
NANO-SCALE SCIENCE;
NANOFABRICATION;
NANOMETRE;
OXIDE NANOSTRUCTURES;
SILICON SURFACES;
TIME-SCALES;
IMAGING TECHNIQUES;
HYDROGEN;
NANOMATERIAL;
OXIDE;
SILICON;
ARTICLE;
ATOMIC FORCE MICROSCOPY;
HYDROGEN BOND;
IMMERSION;
NANOTECHNOLOGY;
OXIDATION;
VELOCITY;
ELECTRON BEAMS;
HYDROGEN;
IMAGE ANALYSIS;
LITHOGRAPHY;
NONMETALS;
OXIDATION;
PASSIVITY;
SILICON;
THROUGHPUT;
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EID: 49949103623
PISSN: 03043991
EISSN: None
Source Type: Journal
DOI: 10.1016/j.ultramic.2008.04.061 Document Type: Article |
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Times cited : (24)
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References (17)
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