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Volumn 18, Issue 19, 2007, Pages
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Nickel silicide nanowires formed in pre-patterned SiO2 trenches and their electrical transport properties
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Author keywords
[No Author keywords available]
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Indexed keywords
ELECTRON TRANSPORT PROPERTIES;
FOCUSED ION BEAMS;
GRAIN BOUNDARIES;
NICKEL COMPOUNDS;
REACTIVE ION ETCHING;
SILICA;
THIN FILMS;
FOCUSED ION BEAM (FIB) ETCHING;
MEAN FREE PATH;
NICKEL SILICIDE;
NANOWIRES;
NANOWIRE;
NICKEL;
SILICON;
ARTICLE;
ELECTRIC ACTIVITY;
ELECTRIC RESISTANCE;
ELECTRON TRANSPORT;
MATERIAL COATING;
MATERIALS TESTING;
NANOTECHNOLOGY;
PARTICLE SIZE;
PRIORITY JOURNAL;
SEMICONDUCTOR;
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EID: 34249038079
PISSN: 09574484
EISSN: 13616528
Source Type: Journal
DOI: 10.1088/0957-4484/18/19/195304 Document Type: Article |
Times cited : (18)
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References (19)
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