Synthesis and structural characterization of highly 〈1 0 0〉-oriented {1 0 0}-faceted nanocrystalline diamond films by microwave plasma chemical vapor deposition

Journal of Crystal Growth

Volumn 311, Issue 8, 2009, Pages 2258-2264

  Tang, C J ^a,b,c   Pereira, S M S ^d   Fernandes, A J S ^c   Neves, A J ^c   Gracio J ^b   Bdikin, I K ^d   Soares, M R ^c   Fu, L S ^d   Gu, L P ^a   Kholkin, A L ^d   Carmo, M C ^c  

^a CHANGSHU INSTITUTE OF TECHNOLOGY   (China)

^b UNIVERSITY OF AVEIRO   (Portugal)

^c UNIVERSITY OF AVEIRO   (Portugal)

^d UNIVERSITY OF AVEIRO   (Portugal)

Author keywords

A1. Characterization; A3. Chemical vapor deposition process; B1. Diamond; B1. Nanomaterials

Indexed keywords

A1. CHARACTERIZATION; A3. CHEMICAL VAPOR DEPOSITION PROCESS; AFM; ATOMIC-FORCE MICROSCOPIES; AVERAGE SIZES; B1. DIAMOND; B1. NANOMATERIALS; CRYSTALLO-GRAPHIC TEXTURES; FOURIER; GROWTH SURFACES; HIGH GROWTH RATES; HIGH POTENTIALS; HIGH QUALITIES; HIGH-POWER MICROWAVES; HIGH-RESOLUTION SCANNING ELECTRON MICROSCOPIES; INFRARED SPECTRUM; MICRO-ELECTRO MECHANICAL SYSTEMS; MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITIONS; MICROWAVE POWER; MORPHOLOGICAL CHARACTERIZATIONS; NANOCRYSTALLINE DIAMOND FILMS; NCD FILMS; PREFERRED ORIENTATIONS; ROOT MEAN SQUARES; SCAN AREAS; SEM; STRUCTURAL CHARACTERIZATIONS; SUBSTRATE TEMPERATURES; SYNTHESIS AND CHARACTERIZATIONS; X- RAY DIFFRACTIONS;

ATOMIC FORCE MICROSCOPY; CARBON NANOTUBES; COMMUNICATION CHANNELS (INFORMATION THEORY); DIAMOND FILMS; DIAMONDS; DOSIMETRY; HIGH RESOLUTION ELECTRON MICROSCOPY; INFRARED SPECTROSCOPY; MICROELECTROMECHANICAL DEVICES; MICROWAVES; NANOCRYSTALLINE MATERIALS; NANOSTRUCTURED MATERIALS; PLASMA DEPOSITION; PLASMAS; SCANNING; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING SILICON COMPOUNDS; SILICON WAFERS; SURFACE ROUGHNESS; SYNTHESIS (CHEMICAL); VAPORS; X RAY DIFFRACTION ANALYSIS;

CHEMICAL VAPOR DEPOSITION;

EID: 65249089184     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2009.01.130     Document Type: Article

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