Optical emission spectroscopy of the plasma during microwave CVD of diamond thin films with nitrogen addition and relation to the thin film morphology

Thin Solid Films

Volumn 308-309, Issue 1-4, 1997, Pages 154-158

  Vandevelde, T ^a   Nesladek, M ^a   Quaeyhaegens, C ^a   Stals, L ^a  

^a HASSELT UNIVERSITY   (Belgium)

Author keywords

Chemical vapour deposition; Optical emission spectroscopy; Thin films

Indexed keywords

CHEMICAL VAPOR DEPOSITION; FILM GROWTH; MORPHOLOGY; NITROGEN; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

MICROWAVE PLASMA ASSISTED CHEMICAL VAPOR DEPOSITION; OPTICAL EMISSION SPECTROSCOPY;

DIAMOND FILMS;

EID: 0031248473     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(97)00408-2     Document Type: Article

References (15)

1. H. Liu and D.S. Dandy, Diamond Chemical Vapor Deposition: Nucleation and Early Growth Stages, Chapter 3, Noyes Publications, Park Ridge, NJ, 1995, p. 14.
2. T. Vandevelde, M. Nesladek, C. Quaeyhaegens and L. Stals, Thin Solid Films, 290-291 (1996) 143.
3. A. Badzian and T. Badzian, Appl. Phys. Lett., 62 (26) (1993) 3432.
4. R. Locher, C. Wild, N. Herres, D. Behr and P. Koidl, Appl. Phys. Lett., 65 (1) (1994) 34.
5. S. Jin and T.D. Moustakas, Appl. Phys. Lett., 65 (4) (1994) 403.
6. T.-M. Hong, S.-H. Chen, Y.-S. Chiou and C.-F. Chen, Thin Solid Films, 270 (1995), 148.
7. P.W. May, P.R. Burridge, C.A. Rego, R.S. Tsang, M.N.R. Ashfold, K.N. Rosser, R.E. Tanner, D. Cherns and R. Vincent, Diamond Relat. Mater., 5 (1996) 354.
8. G.Z. Cao, J.J. Schermer, W.P.J. van Enckevort, W.A.L.M. Elst and L.J. Giling, J. Appl. Phys., 79 (3) (1996) 1357.
9. F. Silva, A. Gicquel, A. Tardieu, P. Cledat and Th. Chauveau, Diamond Relat. Mater., 5 (1996) 338.
10. J.W. Coburn and M. Chen, J. Appl. Phys., 51 (6) (1980) 3134.
11. A. Gicquel, K. Hassouni, S. Farhat, Y. Breton, C.D. Scott, M. Lefebvre and M. Pealat, Diamond Relat. Mater., 3 (1994) 581.
12. D.S. Rickerby, A.M. Jones and B.A. Bellamy, Surf. Coat. Technol., 37 (1989) 111.
13. S.P. Walch, Chem. Phys. Lett., 208 (1993) 214.
14. J.A. Mucha, D.L. Flamm and D.E. Ibbotson, J. Appl. Phys., 65 (9) (1989) 3448.
15. F.G. Celii and J.E. Buttler, Appl. Phys. Lett., 54 (11) (1989) 1031.