The effect of growth rate control on the morphology of nanocrystalline diamond

Diamond and Related Materials

Volumn 14, Issue 3-7, 2005, Pages 404-410

  Subramanian, K ^a   Kang, W P ^a   Davidson, J L ^a,b   Hofmeister, W H ^a  

^a VANDERBILT UNIVERSITY   (United States)

^b VANDERBILT UNIVERSITY   (United States)

Author keywords

Chemical vapor deposition; Field emission; Focused ion beam; Growth rate; Nanocrystalline diamond

Indexed keywords

ASPECT RATIO; CRYSTALLINE MATERIALS; DIAMOND FILMS; DIAMONDS; GROWTH (MATERIALS); ION BEAMS; NUCLEATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

FIELD EMISSIONS; FOCUSED ION BEAMS (FIB); GROWTH RATES; NANOCRYSTALLINE DIAMONDS;

NANOSTRUCTURED MATERIALS;

EID: 18444392088     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2005.01.027     Document Type: Conference Paper

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