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Volumn 406, Issue 1-3, 2005, Pages 197-201
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Ab initio study of nucleation on the diamond (1 0 0) surface during chemical vapor deposition with methyl and H radicals
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Author keywords
[No Author keywords available]
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Indexed keywords
CARRIER MOBILITY;
CHEMICAL VAPOR DEPOSITION;
FREE RADICALS;
METHANE;
NUCLEATION;
THERMAL CONDUCTIVITY;
THERMODYNAMICS;
THIN FILMS;
BAND-GAP;
CRYSTAL QUALITY;
DENSITY FUNCTIONAL THEORY (DFT);
REACTION GROWTH;
DIAMONDS;
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EID: 16244406856
PISSN: 00092614
EISSN: None
Source Type: Journal
DOI: 10.1016/j.cplett.2005.02.116 Document Type: Article |
Times cited : (20)
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References (29)
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