Critical dimension uniformity via real-time photoresist thickness control

IEEE Transactions on Semiconductor Manufacturing

Volumn 20, Issue 4, 2007, Pages 376-380

  Ho, Weng Khuen ^a   Tay, Arthur ^a   Chen, Ming ^a   Fu, Jun ^a   Lu, Haijing ^b   Shan, Xuechuan ^b  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

^b SINGAPORE INSTITUTE OF MANUFACTURING TECHNOLOGY   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

CD NON UNIFORMITIES; CRITICAL DIMENSION CONTROLS; CRITICAL DIMENSION UNIFORMITIES; ON WAFERS; REAL TIME; RUN-TO-RUN CONTROLS;

PHOTORESISTORS; SURFACE TREATMENT;

DATA STORAGE EQUIPMENT;

EID: 64149132732     PISSN: 08946507     EISSN: None     Source Type: Journal    
DOI: 10.1109/TSM.2007.907610     Document Type: Article

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