Swing effects in alternating phase shift mask lithography: Implications of low σ illumination

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 24, Issue 5, 2006, Pages 2326-2330

  Singh, Navab ^a   Sun, H Q ^a   Foo, W H ^a   Mehta, S S ^a   Kumar, R ^a   Adeyeye, A O ^b   Suda, H ^c   Kubota, T ^c   Kimura, Y ^c   Kinoshita, H ^c  

^a INSTITUTE OF MICROELECTRONICS   (Singapore)

^b NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

^c HOYA CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

LIGHTING; LITHOGRAPHY; MASKS;

ALTERNATING PHASE SHIFT MASK (ALT PSM); CRITICAL DIMENSION (CD) SWING EFFECTS; STANDING WAVES;

PHASE SHIFT;

EID: 33749352989     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2353840     Document Type: Article

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