In-field CD uniformity control by altering transmission distribution of the photomask, using Ultra fast pulsed laser technology

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6283 II, Issue , 2006, Pages

  Morikawa, Yasutaka ^a   Sutou, Takanori ^a   Inazuki, Yuichi ^a   Adachi, Takashi ^a   Yoshida, Yuuichi ^a   Kojima, Kouichirou ^a   Sasaki, Shiho ^a   Mohri, Hiroshi ^a   Hayashi, Naoya ^a   Dmitriev, Vladmir ^b   Oshemkov, Sergey ^b   Zait, Eitan ^b   Ben Zvi, Guy ^b  

^a DAI NIPPON PRINTING CO LTD   (Japan)

^b UCLT Ltd   (Israel)

Author keywords

ArF lithography; CD uniformity control; Shade in Elements

Indexed keywords

ARF LITHOGRAPHY; CD UNIFORMITY CONTROL; SHADE-IN-ELEMENTS™;

ATTENUATION; LIGHT TRANSMISSION; LIGHTING; PHOTOLITHOGRAPHY; QUARTZ;

PULSED LASER APPLICATIONS;

EID: 33748078475     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.681762     Document Type: Conference Paper

References (2)

1. Jong R. Park et al., "Improvement of Shot Uniformity on a Wafer by Controlling Backside Transmittance distribution of a Photomask", Proc. SPIE Vol. 5040, p. 553-560, 2003.
2. E. Zait et al., "CD Variations Correction by Local Transmission Control of Photomasks done with a Novel Laser based Process", Proc. SPIE Vol. 6152, 2006. (will be published)