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Volumn 1, Issue 3, 2002, Pages 188-196

High numerical aperture lithographic imagery at the Brewster angle

Author keywords

High NA imagery; High NA optics; High resolution lithography; Holographic lithography; Interferometric lithography; Lithography; Microlithography; Polarization; Swing curve

Indexed keywords


EID: 0037676514     PISSN: 15371646     EISSN: None     Source Type: Journal    
DOI: 10.1117/1.1507337     Document Type: Article
Times cited : (27)

References (14)
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  • 2
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    • Imaging in high-aperture optical systems
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    • Sheppard, C.1    Matthews, H.2
  • 3
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    • TM, a product of KLA-Tencor Corp
    • TM, a product of KLA-Tencor Corp.
  • 4
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    • Optimization of optical properties of photoresist process
    • T. Brunner, "Optimization of optical properties of photoresist process," Proc. SPIE 1466, 297-308 (1991).
    • (1991) Proc. SPIE , vol.1466 , pp. 297-308
    • Brunner, T.1
  • 5
    • 0035758715 scopus 로고    scopus 로고
    • High NA swing curve effects
    • T. Brunner, A. Gabor, C. Wu, and N. Chen, "High NA swing curve effects," Proc. SPIE 4346, 1050-1057 (2001).
    • (2001) Proc. SPIE , vol.4346 , pp. 1050-1057
    • Brunner, T.1    Gabor, A.2    Wu, C.3    Chen, N.4
  • 9
    • 0024664234 scopus 로고
    • Optical projection lithography using lenses with NA greater than I
    • H. Kawata, J. Carter, A. Yen, and H. Smith, "Optical projection lithography using lenses with NA greater than I," Microelectron. Eng. 9, 31-36 (1989).
    • (1989) Microelectron. Eng. , vol.9 , pp. 31-36
    • Kawata, H.1    Carter, J.2    Yen, A.3    Smith, H.4
  • 10
    • 0035519137 scopus 로고    scopus 로고
    • Immersion lithography at 157 nm
    • M. Switkes and M. Rothschild, "Immersion lithography at 157 nm," J. Vac. Sci. Technol. B 19. 2353-2356 (2001).
    • (2001) J. Vac. Sci. Technol. , vol.B19 , pp. 2353-2356
    • Switkes, M.1    Rothschild, M.2
  • 11
    • 0343007082 scopus 로고    scopus 로고
    • DUV interferometric lithography as a tool for assessment of chemically amplified photoresist performance
    • W. Hinsberg, F. A. Houle, J. Hoffnagle, M. Sanchez, G. Wallraff, M. Morrison, and S. Frank, "DUV interferometric lithography as a tool for assessment of chemically amplified photoresist performance," J. Vac. Sci. Technol. B 16(6), 3689 (1998).
    • (1998) J. Vac. Sci. Technol. , vol.B16 , Issue.6 , pp. 3689
    • Hinsberg, W.1    Houle, F.A.2    Hoffnagle, J.3    Sanchez, M.4    Wallraff, G.5    Morrison, M.6    Frank, S.7
  • 12
    • 23044522106 scopus 로고
    • Determination of coupled acid catalysis-diffusion processes in a positive tone chemically amplified photoresist
    • F. A. Houle, W. D. Hinsberg, M. Morrison, M. I. Sanchez, G. Wallraff, C. Larson, and J. Hoffnagle, "Determination of coupled acid catalysis-diffusion processes in a positive tone chemically amplified photoresist," J. Vac. Sci. Technol. B 18(4), 1874 (2000).
    • (1874) J. Vac. Sci. Technol. , vol.B18 , Issue.4 , pp. 2000
    • Houle, F.A.1    Hinsberg, W.D.2    Morrison, M.3    Sanchez, M.I.4    Wallraff, G.5    Larson, C.6    Hoffnagle, J.7
  • 13
    • 0000293405 scopus 로고
    • Experimental verification of high NA effects in photoresist
    • D. G. Flagello and T. D. Milster, "Experimental verification of high NA effects in photoresist," Proc. SPIE 2197, 466-477 (1994).
    • (1994) Proc. SPIE , vol.2197 , pp. 466-477
    • Flagello, D.G.1    Milster, T.D.2
  • 14
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    • Optical lithography as the NA= 1 limit approaches
    • Optical Society of America, Washington, DC
    • A. E. Rosenbluth, T. A. Brunner, and D. G. Flagello, "Optical lithography as the NA= 1 limit approaches," in OSA Annual Meeting Technical Digest 1992, Vol.23, p. 46, Optical Society of America, Washington, DC, (1992).
    • (1992) OSA Annual Meeting Technical Digest 1992 , vol.23 , pp. 46
    • Rosenbluth, A.E.1    Brunner, T.A.2    Flagello, D.G.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.