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Journal of Applied Physics

Volumn 89, Issue 3, 2001, Pages 1861-1865

Mathematical analysis of soft baking in photolithography

(4) Hsu, Jyh Ping a Lin, Sung Hwa a Chen, Wen Chang a Tseng, Shiojenn b

a NATIONAL TAIWAN UNIVERSITY (Taiwan)

b TAMKANG UNIVERSITY (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0042329774 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.1335823 Document Type: Article

Times cited : (6)

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