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Volumn , Issue , 2006, Pages 1-463

Fundamentals of Semiconductor Manufacturing and Process Control

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EID: 84889443764     PISSN: None     EISSN: None     Source Type: Book    
DOI: 10.1002/0471790281     Document Type: Book
Times cited : (315)

References (133)
  • 1
    • 4544316378 scopus 로고    scopus 로고
    • Fundamentals of Semiconductor Fabrication
    • Wiley, New York
    • G. May and S. Sze, Fundamentals of Semiconductor Fabrication, Wiley, New York 2002.
    • (2002)
    • May, G.1    Sze, S.2
  • 2
    • 84925900930 scopus 로고
    • A New Economic History of America
    • McGraw-Hill, New York
    • G. Gunderson, A New Economic History of America, McGraw-Hill, New York, 1976.
    • (1976)
    • Gunderson, G.1
  • 3
    • 0003572833 scopus 로고    scopus 로고
    • Introduction to Statistical Quality Control
    • 3rd ed.,Wiley, New York
    • D. Montgomery, Introduction to Statistical Quality Control, 3rd ed.,Wiley, New York, 1997.
    • (1997)
    • Montgomery, D.1
  • 4
    • 23244437788 scopus 로고    scopus 로고
    • Computer Numerical Control
    • Prentice-Hall, Upper Saddle River, NJ
    • J. Stenerson and K. Curran, Computer Numerical Control, Prentice-Hall, Upper Saddle River, NJ, 1997.
    • (1997)
    • Stenerson, J.1    Curran, K.2
  • 5
    • 84893143448 scopus 로고
    • Steel-Making in Ancient Africa
    • in Blacks in Science: Ancient and Modern, I. Van Sertima, ed., Transaction Books, New Brunswick, NJ
    • D. Shore, "Steel-Making in Ancient Africa," in Blacks in Science: Ancient and Modern, I. Van Sertima, ed., Transaction Books, New Brunswick, NJ, 1986, p. 157.
    • (1986) , pp. 157
    • Shore, D.1
  • 6
    • 0012053450 scopus 로고
    • The Photoresist Story
    • M. Hepher, "The Photoresist Story," J. Photo. Sci. 12, 181 (1964).
    • (1964) J. Photo. Sci. , vol.12 , pp. 181
    • Hepher, M.1
  • 7
    • 84979765962 scopus 로고
    • Ueber Diffusion
    • A. Fick, "Ueber Diffusion," Ann. Phys. Lpz. 170, 59 (1855).
    • (1855) Ann. Phys. Lpz. , vol.170 , pp. 59
    • Fick, A.1
  • 8
    • 0001668444 scopus 로고
    • Ein neues Verfahren zur Messung der Kristallisationsgeschwindigkeit der Metalle
    • J. Czochralski, "Ein neues Verfahren zur Messung der Kristallisationsgeschwindigkeit der Metalle," Z. Phys. Chem. 92, 219 (1918).
    • (1918) Z. Phys. Chem. , vol.92 , pp. 219
    • Czochralski, J.1
  • 9
    • 0001145768 scopus 로고
    • Certain Physical Properties of Single Crystals of Tungsten, Antimony, Bismuth, Tellurium, Cadmium, Zinc, and Tin
    • P. W. Bridgman, "Certain Physical Properties of Single Crystals of Tungsten, Antimony, Bismuth, Tellurium, Cadmium, Zinc, and Tin," Proc. Am. Acad. Arts Sci. 60, 303 (1925).
    • (1925) Proc. Am. Acad. Arts Sci. , vol.60 , pp. 303
    • Bridgman, P.W.1
  • 10
    • 84889469644 scopus 로고
    • Semiconductor Signal Translating Device
    • U.S. Patent 2,597,028
    • W. G. Pfann, Semiconductor Signal Translating Device, U.S. Patent 2,597,028 (1952).
    • (1952)
    • Pfann, W.G.1
  • 11
    • 84889486832 scopus 로고
    • Fabrication of Semiconductor Devices
    • U.S. Patent 3,122,817 (filed 1957; granted
    • J. Andrus, Fabrication of Semiconductor Devices, U.S. Patent 3,122,817 (filed 1957; granted 1964).
    • (1964)
    • Andrus, J.1
  • 12
    • 0000588944 scopus 로고
    • Surface Protection and Selective Masking during Diffusion in Silicon
    • C. J. Frosch and L. Derrick, "Surface Protection and Selective Masking during Diffusion in Silicon," J. Electrochem. Soc. 104, 547 (1957).
    • (1957) J. Electrochem. Soc. , vol.104 , pp. 547
    • Frosch, C.J.1    Derrick, L.2
  • 13
    • 84917853113 scopus 로고
    • Growth of Single-Crystal Layers of Silicon and Germanium from the Vapor Phase
    • N. N. Sheftal, N. P. Kokorish, and A. V. Krasilov, "Growth of Single-Crystal Layers of Silicon and Germanium from the Vapor Phase," Bull. Acad. Sci USSR, Phys. Ser. 21, 140, (1957).
    • (1957) Bull. Acad. Sci USSR, Phys. Ser. , vol.21 , pp. 140
    • Sheftal, N.N.1    Kokorish, N.P.2    Krasilov, A.V.3
  • 14
    • 4243998437 scopus 로고
    • Forming Semiconductor Device by Ionic Bombardment
    • U.S. Patent 2,787,564
    • W. Shockley, Forming Semiconductor Device by Ionic Bombardment, U.S. Patent 2,787,564 (1958).
    • (1958)
    • Shockley, W.1
  • 16
    • 0013356682 scopus 로고
    • Semiconductor Device-and-Lead Structure
    • U.S. Patent 2,981,877 (filed 1959, granted
    • R. N. Noyce, Semiconductor Device-and-Lead Structure, U.S. Patent 2,981,877 (filed 1959, granted 1961).
    • (1961)
    • Noyce, R.N.1
  • 18
    • 0003608201 scopus 로고
    • Field Effect Transistor Memory
    • U.S. Patent 3,387,286 (filed 1967, granted
    • R. M. Dennard, Field Effect Transistor Memory, U.S. Patent 3,387,286 (filed 1967, granted 1968).
    • (1968)
    • Dennard, R.M.1
  • 19
    • 45849089058 scopus 로고
    • Method for Making MIS Structure
    • U.S. Patent 3,475,234
    • R. E. Kerwin, D. L. Klein, and J. C. Sarace, Method for Making MIS Structure, U.S. Patent 3,475,234 (1969).
    • (1969)
    • Kerwin, R.E.1    Klein, D.L.2    Sarace, J.C.3
  • 20
    • 0014614521 scopus 로고
    • The Use of Metal-Organic in the Preparation of Semiconductor Materials. I. Epitaxial Gallium-V Compounds
    • H. M. Manasevit and W. I. Simpson, "The Use of Metal-Organic in the Preparation of Semiconductor Materials. I. Epitaxial Gallium-V Compounds," J. Electrochem. Soc. 116, 1725 (1969).
    • (1969) J. Electrochem. Soc. , vol.116 , pp. 1725
    • Manasevit, H.M.1    Simpson, W.I.2
  • 21
    • 61949202783 scopus 로고
    • Gas Plasma Vapor Etching Process
    • U.S. Patent 3,615,956
    • S. M. Irving, K. E. Lemons, and G. E. Bobos, Gas Plasma Vapor Etching Process, U.S. Patent 3,615,956 (1971).
    • (1971)
    • Irving, S.M.1    Lemons, K.E.2    Bobos, G.E.3
  • 22
    • 0002791888 scopus 로고
    • Film Deposition by Molecular Beam Technique
    • A. Y. Cho, "Film Deposition by Molecular Beam Technique," J. Vac. Sci. Technol. 8, S31 (1971).
    • (1971) J. Vac. Sci. Technol. , vol.8
    • Cho, A.Y.1
  • 23
    • 0041731689 scopus 로고
    • Portraits in Silicon
    • MIT Press, Cambridge, MA
    • R. Slater, Portraits in Silicon, MIT Press, Cambridge, MA, 1987, p. 175.
    • (1987) , pp. 175
    • Slater, R.1
  • 25
    • 0024895494 scopus 로고
    • A New Planarization Technique, Using a Combination of RIE and Chemical Mechanical Polish (CMP)
    • B. Davari et al., "A New Planarization Technique, Using a Combination of RIE and Chemical Mechanical Polish (CMP)," Tech. Digest IEEE Int. Electron Devices Meet., 1989, p. 61.
    • (1989) Tech. Digest IEEE Int. Electron Devices Meet. , pp. 61
    • Davari, B.1
  • 26
    • 0027848479 scopus 로고
    • High Performance Dielectrics and Processes for ULSI Interconnection Technologies
    • J. Paraszczak et al., "High Performance Dielectrics and Processes for ULSI Interconnection Technologies," Tech. Digest IEEE Int. Electron Devices Meet., 1993, p. 261.
    • (1993) Tech. Digest IEEE Int. Electron Devices Meet. , pp. 261
    • Paraszczak, J.1
  • 27
    • 18244426658 scopus 로고    scopus 로고
    • Top Fabs of 1996
    • M. Dax, "Top Fabs of 1996," Semiconductor Intl. 19(5) (1996).
    • (1996) Semiconductor Intl. , vol.19 , Issue.5
    • Dax, M.1
  • 28
    • 0024881811 scopus 로고
    • Computer-Integrated Manufacturing of VLSI
    • Proc. IEEE/CHMT Intl. Electron. Manuf. Tech. Symp.
    • D. Hodges, L. Rowe, and C. Spanos, "Computer-Integrated Manufacturing of VLSI," Proc. IEEE/CHMT Intl. Electron. Manuf. Tech. Symp., 1989.
    • (1989)
    • Hodges, D.1    Rowe, L.2    Spanos, C.3
  • 29
    • 84889433803 scopus 로고    scopus 로고
    • IEEE Electron Devices Society, Fifty Years of Electron Devices, IEEE, Piscataway, NJ
    • IEEE Electron Devices Society, Fifty Years of Electron Devices, IEEE, Piscataway, NJ, 2002.
    • (2002)
  • 30
    • 0004112656 scopus 로고    scopus 로고
    • Itz Run-to-Ru Control in Semiconductor Manufacturing
    • CRC Press, Boca Raton, FL
    • J. Moyne, E. del Castillo, and A. Hu, itz Run-to-Ru, Control in Semiconductor Manufacturing, CRC Press, Boca Raton, FL, 2001.
    • (2001)
    • Moyne, J.1    Del Castillo, E.2    Hu, A.3
  • 31
    • 0026897766 scopus 로고
    • Economics of Semiconductor Production
    • M. Penn, "Economics of Semiconductor Production," Microelectron. J. 23, 255-265 (1992).
    • (1992) Microelectron. J. , vol.23 , pp. 255-265
    • Penn, M.1
  • 32
    • 0004090993 scopus 로고    scopus 로고
    • Fundamentals of Microsystems Packaging
    • McGraw-Hill, New York
    • R. Tummala (ed.), Fundamentals of Microsystems Packaging, McGraw-Hill, New York, 2001.
    • (2001)
    • Tummala, R.1
  • 33
    • 0004214992 scopus 로고
    • Microelectronics Manufacturing Diagnostics Handbook
    • Van Nostrand Reinhold, New York
    • A. Landzberg, Microelectronics Manufacturing Diagnostics Handbook, Van Nostrand Reinhold, New York, 1993.
    • (1993)
    • Landzberg, A.1
  • 34
    • 0004126694 scopus 로고
    • Estimating Device Reliability: Assessment of Credibility
    • Kluwer Academic Publishers, Boston, MA
    • F. Nash, Estimating Device Reliability: Assessment of Credibility, Kluwer Academic Publishers, Boston, MA, 1993.
    • (1993)
    • Nash, F.1
  • 35
    • 0003838056 scopus 로고    scopus 로고
    • Advanced Electronic Packaging
    • IEEE Press, New York
    • W. Brown (ed.), Advanced Electronic Packaging, IEEE Press, New York, 1999.
    • (1999)
    • Brown, W.1
  • 37
    • 4544316378 scopus 로고    scopus 로고
    • Fundamentals of Semiconductor Fabrication
    • Wiley, New York
    • G. May and S. Sze, Fundamentals of Semiconductor Fabrication, Wiley, New York, 2003.
    • (2003)
    • May, G.1    Sze, S.2
  • 38
    • 0003838056 scopus 로고    scopus 로고
    • Advanced Electronic Packaging
    • IEEE Press, New York
    • W. Brown, ed., Advanced Electronic Packaging, IEEE Press, New York, 1999.
    • (1999)
    • Brown, W.1
  • 39
    • 0004090993 scopus 로고    scopus 로고
    • Fundamentals of Microsystems Packaging
    • McGraw-Hill, New York
    • R. Tummala, ed., Fundamentals of Microsystems Packaging, McGraw-Hill, New York, 2001.
    • (2001)
    • Tummala, R.1
  • 40
    • 84889276968 scopus 로고
    • Physics, NY: Wiley, New York
    • D. Halliday and R. Resnick, Physics, NY: Wiley, New York, 1978.
    • (1978)
    • Halliday, D.1    Resnick, R.2
  • 41
    • 33747913042 scopus 로고
    • Manufacturing Integration of Real-Time Laser Interferometry to Isotropically Etch Silicon Oxide Films for Contacts and Vias
    • Proc. SPIE Conf.Microelectronic Processing
    • J. Pope, R. Woodburn, J. Watkins, R. Lachenbruch, and G. Viloria, "Manufacturing Integration of Real-Time Laser Interferometry to Isotropically Etch Silicon Oxide Films for Contacts and Vias," Proc. SPIE Conf.Microelectronic Processing, Vol. 2091, 1993, pp. 185-196.
    • (1993) , vol.2091 , pp. 185-196
    • Pope, J.1    Woodburn, R.2    Watkins, J.3    Lachenbruch, R.4    Viloria, G.5
  • 43
    • 0031077370 scopus 로고    scopus 로고
    • An Extended Kalman Filtering-Based Method of Processing Reflectometry Data for Fast In-Situ Etch Rate Measurements
    • Feb.
    • T. Vincent, P. Khargonekar, and F. Terry, "An Extended Kalman Filtering-Based Method of Processing Reflectometry Data for Fast In-Situ Etch Rate Measurements," IEEE Trans. Semiconduct. Manuf. 10(1), (Feb. 1997).
    • (1997) IEEE Trans. Semiconduct. Manuf. , vol.10 , Issue.1
    • Vincent, T.1    Khargonekar, P.2    Terry, F.3
  • 44
    • 0031143606 scopus 로고    scopus 로고
    • Endpoint Prediction for Polysilicon Plasma Etch via Optical Emission Interferometry
    • May/June
    • K. Wong, D. Boning, H. Sawin, S. Butler, and E. Sachs, "Endpoint Prediction for Polysilicon Plasma Etch via Optical Emission Interferometry," J. Vac. Sci. Technol. A. 15(3), (May/June 1997).
    • (1997) J. Vac. Sci. Technol. A. , vol.15 , Issue.3
    • Wong, K.1    Boning, D.2    Sawin, H.3    Butler, S.4    Sachs, E.5
  • 45
    • 0003684325 scopus 로고    scopus 로고
    • Spectroscopic Ellipsometry and Reflectometry,Wiley
    • New York
    • H. Tompkins andW. McGahan, Spectroscopic Ellipsometry and Reflectometry,Wiley, New York, 1999.
    • (1999)
    • Tompkins, H.1    McGahan, W.2
  • 46
    • 0009599723 scopus 로고    scopus 로고
    • Using Optical Metrology to Monitor Low-K Dielectric Thin Films
    • Micro 31-38, May
    • F. Yang, W. McGahan, C. Mohler, and L. Booms, "Using Optical Metrology to Monitor Low-K Dielectric Thin Films," Micro 31-38 (May 2000).
    • (2000)
    • Yang, F.1    McGahan, W.2    Mohler, C.3    Booms, L.4
  • 47
    • 0009620065 scopus 로고
    • Epioptics
    • Springer-Verlag, New York
    • J. McGilp, D. Weaire, and C. Patterson (eds), Epioptics, Springer-Verlag, New York, 1995.
    • (1995)
    • McGilp, J.1    Weaire, D.2    Patterson, C.3
  • 48
    • 0003474751 scopus 로고
    • Numerical Recipes in C
    • Cambridge Univ. Press, Cambridge, MA
    • W. Press, B. Flannery, S. Teukolsky, and W. Vetterling, Numerical Recipes in C, Cambridge Univ. Press, Cambridge, MA, 1988.
    • (1988)
    • Press, W.1    Flannery, B.2    Teukolsky, S.3    Vetterling, W.4
  • 49
    • 0034314734 scopus 로고    scopus 로고
    • Two-Channel Spectroscopic Reflectometry for In-Situ Monitoring of Blanket and Patterned Structures During Reactive Ion Etching
    • Nov./Dec.
    • B. Stutzman, H. Huang, and F. Terry, "Two-Channel Spectroscopic Reflectometry for In-Situ Monitoring of Blanket and Patterned Structures During Reactive Ion Etching," J. Vac. Sci. Technol. B. 18(6), (Nov./Dec. 2000).
    • (2000) J. Vac. Sci. Technol. B. , vol.18 , Issue.6
    • Stutzman, B.1    Huang, H.2    Terry, F.3
  • 50
    • 0003585771 scopus 로고
    • Introduction to Microelectronic Fabrication
    • Addison-Wesley, Reading, MA
    • R. Jaeger, Introduction to Microelectronic Fabrication, Addison-Wesley, Reading, MA, 1993.
    • (1993)
    • Jaeger, R.1
  • 51
    • 0003699181 scopus 로고    scopus 로고
    • Silicon Processing for the VLSI Era
    • Lattice Press, Sunset Beach, CA
    • S. Wolf and R. Tauber, Silicon Processing for the VLSI Era, Lattice Press, Sunset Beach, CA, 2000.
    • (2000)
    • Wolf, S.1    Tauber, R.2
  • 52
    • 0004214992 scopus 로고
    • Microelectronics Manufacturing Diagnostics Handbook
    • Van Nostrand Reinhold, New York
    • A. Landzberg, Microelectronics Manufacturing Diagnostics Handbook, Van Nostrand Reinhold, New York, 1993.
    • (1993)
    • Landzberg, A.1
  • 53
    • 0033908119 scopus 로고    scopus 로고
    • Angle-Resolved Scatterometry for Semiconductor Manufacturing
    • winter
    • C. Raymond, "Angle-Resolved Scatterometry for Semiconductor Manufacturing," Microlithogry. World (winter 2000).
    • (2000) Microlithogry. World
    • Raymond, C.1
  • 54
    • 84889290405 scopus 로고    scopus 로고
    • Integrated CircuitManufacturability
    • IEEE Press, Piscataway, NJ
    • J. Pineda de Gyvez and D. Pradhan, Integrated CircuitManufacturability, IEEE Press, Piscataway, NJ, 1999.
    • (1999)
    • Pineda de Gyvez, J.1    Pradhan, D.2
  • 55
    • 0003397559 scopus 로고    scopus 로고
    • The Science and Engineering of Microelectronic Fabrication
    • Oxford Univ. Press, New York
    • S. Campbell, The Science and Engineering of Microelectronic Fabrication, Oxford Univ. Press, New York, 2001.
    • (2001)
    • Campbell, S.1
  • 56
    • 0004255148 scopus 로고
    • Plasma Etching: An Introduction
    • Academic Press, San Diego, CA
    • D. Manos and D. Flamm, Plasma Etching: An Introduction, Academic Press, San Diego, CA, 1989.
    • (1989)
    • Manos, D.1    Flamm, D.2
  • 57
    • 0034313462 scopus 로고    scopus 로고
    • Real-Time Control of Reactive Ion Etching Using Neural Networks
    • Nov.
    • D. Stokes and G. May, "Real-Time Control of Reactive Ion Etching Using Neural Networks," IEEE Trans. Semiconduct. Manuf. 13(4), 469-480 (Nov. 2000).
    • (2000) IEEE Trans. Semiconduct. Manuf. , vol.13 , Issue.4 , pp. 469-480
    • Stokes, D.1    May, G.2
  • 58
    • 0001277185 scopus 로고    scopus 로고
    • Infrared Absorption Analysis of Organosilicon/Oxygen Plasmas in a Microwave Multipolar Plasma Excited by Distributed Electron Cyclotron Resonance
    • P. Raynaud, T. Amilis, and Y. Segui, "Infrared Absorption Analysis of Organosilicon/Oxygen Plasmas in a Microwave Multipolar Plasma Excited by Distributed Electron Cyclotron Resonance," Appl. Surf. Sci. 138-139, 285-291 (1999).
    • (1999) Appl. Surf. Sci. , vol.138-139 , pp. 285-291
    • Raynaud, P.1    Amilis, T.2    Segui, Y.3
  • 59
    • 30844455153 scopus 로고    scopus 로고
    • The Role of RF Measurements in Plasma Etching
    • Aug.
    • C. Almgren, "The Role of RF Measurements in Plasma Etching," Semicond. Intl. 99-104 (Aug. 1997).
    • (1997) Semicond. Intl. , pp. 99-104
    • Almgren, C.1
  • 60
    • 0003572833 scopus 로고    scopus 로고
    • Introduction to Statistical Quality Control
    • Wiley, New York
    • D. Montgomery, Introduction to Statistical Quality Control, Wiley, New York, 1993.
    • (1993)
    • Montgomery, D.1
  • 61
    • 84938162176 scopus 로고
    • Cost-Size Optima of Monolithic Integrated Circuits
    • Dec.
    • B. Murphy, "Cost-Size Optima of Monolithic Integrated Circuits," Proc. IEEE 52(12), 1537-1545 (Dec. 1964).
    • (1964) Proc. IEEE , vol.52 , Issue.12 , pp. 1537-1545
    • Murphy, B.1
  • 62
    • 84889290405 scopus 로고    scopus 로고
    • Integrated CircuitManufacturability
    • IEEE Press
    • J. Piñeda de Gyvez and D. Pradhan, Integrated CircuitManufacturability, IEEE Press, 1999.
    • (1999)
    • Piñeda De Gyvez, J.1    Pradhan, D.2
  • 63
    • 4243564465 scopus 로고
    • Yield and Cost Analysis of Bipolar LSI
    • Washington, DC, Oct.
    • R. Seeds, "Yield and Cost Analysis of Bipolar LSI," IEEE Intl. Electron Devices Meet., Washington, DC, Oct., 1967.
    • (1967) IEEE Intl. Electron Devices Meet.
    • Seeds, R.1
  • 64
    • 0014923116 scopus 로고
    • A New Look at Yield of Integrated Circuits
    • Aug.
    • J. Price, "A New Look at Yield of Integrated Circuits," Proc. IEEE (Lett.) 58, 1290-1291 (Aug. 1970).
    • (1970) Proc. IEEE (Lett.) , vol.58 , pp. 1290-1291
    • Price, J.1
  • 65
    • 84889324177 scopus 로고
    • Analysis of Yield of Integrated Circuits and a New Expression for the Yield
    • in Defect and Fault Tolerance in VLSI Systems, C. Stapper, ed., Plenum Press
    • T. Okabe, Nagata, and Shimada, "Analysis of Yield of Integrated Circuits and a New Expression for the Yield," in Defect and Fault Tolerance in VLSI Systems, C. Stapper, ed., Vol. 2, Plenum Press, 1990, pp. 47-61.
    • (1990) , vol.2 , pp. 47-61
    • Okabe, T.1    Nagata2    Shimada3
  • 66
    • 0001736927 scopus 로고
    • Fact and Fiction in Yield Modeling
    • May
    • C. Stapper, "Fact and Fiction in Yield Modeling," Microelectron. J. 210(1-2), 129-151 (May 1989).
    • (1989) Microelectron. J. , vol.210 , pp. 129-151
    • Stapper, C.1
  • 67
    • 0025433611 scopus 로고
    • The Use and Evaluation of Yield Models in Integrated Circuit Manufacturing
    • May
    • J. Cunningham, "The Use and Evaluation of Yield Models in Integrated Circuit Manufacturing," IEEE Trans. Semiconduct. Manuf. 3(2), 60-71 (May 1990).
    • (1990) IEEE Trans. Semiconduct. Manuf. , vol.3 , Issue.2 , pp. 60-71
    • Cunningham, J.1
  • 68
    • 84889447203 scopus 로고
    • A Simplified Method for Modeling VLSI Yields
    • July
    • C. Stapper and R. Rossner, "A Simplified Method for Modeling VLSI Yields," Solid State Electron. 25(6), 655-657 (July 1973).
    • (1973) Solid State Electron. , vol.25 , Issue.6 , pp. 655-657
    • Stapper, C.1    Rossner, R.2
  • 69
    • 0021466353 scopus 로고
    • Modeling Defects in Integrated Circuit Photolithographic Patterns
    • July
    • C. Stapper, "Modeling Defects in Integrated Circuit Photolithographic Patterns," IBM J. Res. Devel. 28(4), 461-475 (July 1984).
    • (1984) IBM J. Res. Devel. , vol.28 , Issue.4 , pp. 461-475
    • Stapper, C.1
  • 70
    • 0003838056 scopus 로고    scopus 로고
    • Advanced Electronic Packaging
    • IEEE Press, Piscataway, NJ
    • W. Brown, Advanced Electronic Packaging, IEEE Press, Piscataway, NJ, 1999.
    • (1999)
    • Brown, W.1
  • 71
    • 0020782723 scopus 로고
    • Statistical Simulation of the IC Manufacturing Process
    • July
    • W. Maly and A. Strojwas, "Statistical Simulation of the IC Manufacturing Process," IEEE Trans. CAD ICs Syst. 1(3) (July 1982).
    • (1982) IEEE Trans. CAD ICs Syst. , vol.1 , Issue.3
    • Maly, W.1    Strojwas, A.2
  • 72
    • 0003461172 scopus 로고
    • Yield Simulation for Integrated Circuits
    • Kluwer, Boston
    • D. Walker, Yield Simulation for Integrated Circuits, Kluwer, Boston, 1987.
    • (1987)
    • Walker, D.1
  • 73
    • 84889489932 scopus 로고
    • A Point Basis for Statistical Design
    • Proc. IEEE Intl. Symp. Circuits and Systems, New York, May
    • S. Director and G. Hatchel, "A Point Basis for Statistical Design," Proc. IEEE Intl. Symp. Circuits and Systems, New York, May, 1978.
    • (1978)
    • Director, S.1    Hatchel, G.2
  • 74
    • 0019242382 scopus 로고
    • Acceptability Regions for a Class of Linear Networks
    • Proc. IEEE Intl. Symp. Circuits and Systems, Houston, May
    • J. Ogrodzki, L. Opalski, and M. Styblinski, "Acceptability Regions for a Class of Linear Networks," Proc. IEEE Intl. Symp. Circuits and Systems, Houston, May 1980.
    • (1980)
    • Ogrodzki, J.1    Opalski, L.2    Styblinski, M.3
  • 75
    • 0017515253 scopus 로고
    • The Simpilical Approximation Approach to Design Centering
    • July
    • S. Director and G. Hatchel, "The Simpilical Approximation Approach to Design Centering," IEEE Trans. Circuits Syst. CAS-24(7) (July 1977).
    • (1977) IEEE Trans. Circuits Syst. , vol.CAS-24 , Issue.7
    • Director, S.1    Hatchel, G.2
  • 76
    • 0029304803 scopus 로고
    • Semiconductor Yield Improvement: Results and Best Practices
    • May
    • S. Cunningham, C. J. Spanos, and K. Voros, "Semiconductor Yield Improvement: Results and Best Practices", IEEE Trans. Semiconduct. Manuf. 8(2), 103-109 (May 1995).
    • (1995) IEEE Trans. Semiconduct. Manuf , vol.8 , Issue.2 , pp. 103-109
    • Cunningham, S.1    Spanos, C.J.2    Voros, K.3
  • 77
    • 0003572833 scopus 로고    scopus 로고
    • Introduction to Statistical Quality Control
    • Wiley, New York
    • D. Montgomery, Introduction to Statistical Quality Control, Wiley, New York, 1993.
    • (1993)
    • Montgomery, D.1
  • 78
    • 0003970650 scopus 로고
    • Quality Control and Industrial Statistics
    • Irwin, Homewood, IL
    • A. Duncan, Quality Control and Industrial Statistics, Irwin, Homewood, IL, 1974.
    • (1974)
    • Duncan, A.1
  • 79
    • 0003879203 scopus 로고
    • Statistical Quality Control Handbook
    • Western Electric Corp., Indianapolis, IN
    • Western Electric, Statistical Quality Control Handbook, Western Electric Corp., Indianapolis, IN, 1956.
    • (1956)
    • Electric, W.1
  • 80
    • 0003397559 scopus 로고    scopus 로고
    • The Science and Engineering of Microelectronic Fabrication
    • Oxford Univ. Press, New York
    • S. Campbell, The Science and Engineering of Microelectronic Fabrication, Oxford Univ. Press, New York, 2001.
    • (2001)
    • Campbell, S.1
  • 81
    • 84867057936 scopus 로고
    • Cumulative Sum Control Charting: An Underutilized SPC Tool
    • D. Hawkins, "Cumulative Sum Control Charting: An Underutilized SPC Tool," Qual. Engi. 5 (1993).
    • (1993) Qual. Engi. , pp. 5
    • Hawkins, D.1
  • 83
    • 0004074760 scopus 로고
    • Statistics for Experimenters
    • Wiley, New York
    • G. Box, W. Hunter, and J. Hunter, Statistics for Experimenters, Wiley, New York, 1978.
    • (1978)
    • Box, G.1    Hunter, W.2    Hunter, J.3
  • 84
    • 0000133998 scopus 로고
    • An Analysis of Transformations
    • G. Box and D. Cox, "An Analysis of Transformations," J. Roy. Stat. Soc. B. 26, 211 (1964).
    • (1964) J. Roy. Stat. Soc. B. , vol.26 , pp. 211
    • Box, G.1    Cox, D.2
  • 85
    • 0003572833 scopus 로고    scopus 로고
    • Introduction to Statistical Quality Control
    • Wiley, New York
    • D. Montgomery, Introduction to Statistical Quality Control, Wiley, New York, 1993.
    • (1993)
    • Montgomery, D.1
  • 86
    • 33751291059 scopus 로고
    • Control Japan Quality Control Organization
    • Nagoya, Japan
    • G. Taguchi and Y. Wu, Control Japan Quality Control Organization, Nagoya, Japan, 1980.
    • (1980)
    • Taguchi, G.1    Wu, Y.2
  • 87
    • 0020750263 scopus 로고
    • Off-Line Quality Control in Integrated Circuit Fabrication Using Experimental Design
    • May-June
    • M. Phadke, R. Kackar, D. Speeney, and M. Grieco, "Off-Line Quality Control in Integrated Circuit Fabrication Using Experimental Design," Bell Syst. Tech. J., (May-June 1983).
    • (1983) Bell Syst. Tech. J.
    • Phadke, M.1    Kackar, R.2    Speeney, D.3    Grieco, M.4
  • 88
    • 0004074760 scopus 로고
    • Statistics for Experimenters
    • Wiley, New York
    • G. Box, W. Hunter, and J. Hunter, Statistics for Experimenters, Wiley, New York, 1978.
    • (1978)
    • Box, G.1    Hunter, W.2    Hunter, J.3
  • 89
    • 84889429570 scopus 로고
    • RS/Explore Primer, BBN Software Products, Cambridge, MA
    • RS/Explore Primer, BBN Software Products, Cambridge, MA, 1992.
    • (1992)
  • 90
    • 0003572833 scopus 로고    scopus 로고
    • Introduction to Statistical Quality Control
    • Wiley, New York
    • D. Montgomery, Introduction to Statistical Quality Control, Wiley, New York, 1993.
    • (1993)
    • Montgomery, D.1
  • 91
    • 0026153051 scopus 로고
    • Statistical experimental Design in Plasma Etch Modeling
    • May
    • G. May, J. Huang, and C. Spanos, "Statistical experimental Design in Plasma Etch Modeling," IEEE Trans. Semiconduct. Manuf. 4(2) (May 1991).
    • (1991) IEEE Trans. Semiconduct. Manuf. , vol.4 , Issue.2
    • May, G.1    Huang, J.2    Spanos, C.3
  • 92
    • 84889380489 scopus 로고
    • RS/Discover User's Guide, BBN Software Products, Cambridge, MA
    • RS/Discover User's Guide, BBN Software Products, Cambridge, MA, 1992.
    • (1992)
  • 93
    • 0003486756 scopus 로고
    • Design and Analysis of Experiments
    • 3rd ed., Wiley, New York
    • D. Montgomery, Design and Analysis of Experiments, 3rd ed., Wiley, New York, 1991.
    • (1991)
    • Montgomery, D.1
  • 94
    • 0003946510 scopus 로고
    • Principal Component Analysis
    • Springer-Verlag, New York
    • I. Joliffe, Principal Component Analysis, Springer-Verlag, New York, 1986.
    • (1986)
    • Joliffe, I.1
  • 95
    • 0344896839 scopus 로고    scopus 로고
    • Neural Network Modeling of Reactive Ion Etching Using Optical Emission Spectroscopy Data
    • Nov.
    • S. Hong, G. May, and D. Park, "Neural Network Modeling of Reactive Ion Etching Using Optical Emission Spectroscopy Data," IEEE Trans. Semiconduct. Manuf. 16(4) (Nov. 2003).
    • (2003) IEEE Trans. Semiconduct. Manuf. , vol.16 , Issue.4
    • Hong, S.1    May, G.2    Park, D.3
  • 96
    • 84889362195 scopus 로고    scopus 로고
    • Computational Intelligence in Microelectronics Manufacturing
    • in Handbook of Computational Intelligence in Design and Manufacturing, J. Wang and A. Kusiak, eds., CRC Press, Boca Raton, FL, Chapter 13
    • kG. May, "Computational Intelligence in Microelectronics Manufacturing," in Handbook of Computational Intelligence in Design and Manufacturing, J. Wang and A. Kusiak, eds., CRC Press, Boca Raton, FL, 2001, Chapter 13.
    • (2001)
    • May, K.G.1
  • 97
    • 0021835689 scopus 로고
    • Neural Computation of Decisions in Optimization Problems
    • J. Hopfield and D. Tank, "Neural Computation of Decisions in Optimization Problems," Biol. Cybern. 52 (1985).
    • (1985) Biol. Cybern. , pp. 52
    • Hopfield, J.1    Tank, D.2
  • 98
    • 0028507249 scopus 로고
    • Manufacturing IC's the Neural Way
    • Sept.
    • G. May, "Manufacturing IC's the Neural Way," IEEE Spectrum. 31(9) (Sept. 1994).
    • (1994) IEEE Spectrum. , vol.31 , Issue.9
    • May, G.1
  • 99
    • 0024125987 scopus 로고
    • Capabilities of Three-Layered Perceptrons
    • Proc. IEEE Intl. Conf. Neural Networks
    • B. Irie and S. Miyake, "Capabilities of Three-Layered Perceptrons," Proc. IEEE Intl. Conf. Neural Networks, 1988.
    • (1988)
    • Irie, B.1    Miyake, S.2
  • 100
    • 0027592466 scopus 로고
    • Advantages of Plasma Etch Modeling Using Neural Networks over Statistical Techniques
    • May
    • C. Himmel and G. May, "Advantages of Plasma Etch Modeling Using Neural Networks over Statistical Techniques," IEEE Trans. Semiconduct. Manuf. 6(2) (May 1993).
    • (1993) IEEE Trans. Semiconduct. Manuf. , vol.6 , Issue.2
    • Himmel, C.1    May, G.2
  • 102
    • 0006373178 scopus 로고    scopus 로고
    • A Review of Probabilistic, Fuzzy, and Neural Models for Pattern Recognition
    • in Fuzzy Logic and Neural Network Handbook, C. H. Chen, ed., McGraw-Hill, New York, Chapter 2
    • J. Bezdek, "A Review of Probabilistic, Fuzzy, and Neural Models for Pattern Recognition," in Fuzzy Logic and Neural Network Handbook, C. H. Chen, ed., McGraw-Hill, New York, 1996, Chapter 2.
    • (1996)
    • Bezdek, J.1
  • 103
    • 0021892282 scopus 로고
    • Fuzzy Identification of Systems and Its Applications to Modeling and Control
    • IEEE Trans. Syst. Manuf. Cybern. SMC-15 (Jan./Feb.
    • T. Takagi and M. Sugeno, "Fuzzy Identification of Systems and Its Applications to Modeling and Control," IEEE Trans. Syst. Manuf. Cybern. SMC-15 (Jan./Feb. 1985).
    • (1985)
    • Takagi, T.1    Sugeno, M.2
  • 104
    • 0029359146 scopus 로고
    • Fuzzy Logic Models for Thermally Based Microelectronic Manufacturing Processes
    • Aug.
    • H. Xie, R. Mahajan, and Y. Lee, "Fuzzy Logic Models for Thermally Based Microelectronic Manufacturing Processes," IEEE Trans. Semiconduct. Manuf. 8(3) (Aug. 1995).
    • (1995) IEEE Trans. Semiconduct. Manuf. , vol.8 , Issue.3
    • Xie, H.1    Mahajan, R.2    Lee, Y.3
  • 105
    • 0001477308 scopus 로고
    • An Iterative Method for Finding Stationary Values of a Function of Several Variables
    • M. J. D. Powell, "An Iterative Method for Finding Stationary Values of a Function of Several Variables," Comput. J. 5, 147-151 (1962).
    • (1962) Comput. J. , vol.5 , pp. 147-151
    • Powell, M.J.D.1
  • 106
    • 0000238336 scopus 로고
    • A Simplex Method for Function Minimization
    • J. A. Nelder and R. Mead, "A Simplex Method for Function Minimization," Comput. J. 7, 308-313 (1965).
    • (1965) Comput. J. , vol.7 , pp. 308-313
    • Nelder, J.A.1    Mead, R.2
  • 107
    • 0003463297 scopus 로고
    • Adaptation in Natural and Artificial Systems
    • Univ. Michigan Press, Ann Arbor, MI
    • J. H. Holland, Adaptation in Natural and Artificial Systems, Univ. Michigan Press, Ann Arbor, MI, 1975.
    • (1975)
    • Holland, J.H.1
  • 108
    • 0031146624 scopus 로고    scopus 로고
    • Using Neural Network Process Models to Perform PECVD Silicon Dioxide Recipe Synthesis via Genetic Algorithms
    • May
    • S. Han and G. May, "Using Neural Network Process Models to Perform PECVD Silicon Dioxide Recipe Synthesis via Genetic Algorithms," IEEE Trans. Semiconduct. Manuf. 10(2), 279-287 (May 1997).
    • (1997) IEEE Trans. Semiconduct. Manuf. , vol.10 , Issue.2 , pp. 279-287
    • Han, S.1    May, G.2
  • 109
    • 0004112656 scopus 로고    scopus 로고
    • itz Run-to-Ru Control in Semiconductor Manufacturing
    • CRC Press, Boca Raton, FL
    • J. Moyne, E. del Castillo, and A. Hu, itz Run-to-Ru, Control in Semiconductor Manufacturing, CRC Press, Boca Raton, FL, 2001.
    • (2001)
    • Moyne, J.1    Del Castillo, E.2    Hu, A.3
  • 110
    • 84887280274 scopus 로고
    • Run by Run Process Control: Combining SPC and Feedback Control
    • Feb.
    • E. Sachs, A. Hu, and A. Ingolfsson, "Run by Run Process Control: Combining SPC and Feedback Control," IEEE Trans. Semiconduct. Manuf. 8(1) (Feb. 1995).
    • (1995) IEEE Trans. Semiconduct. Manuf. , vol.8 , Issue.1
    • Sachs, E.1    Hu, A.2    Ingolfsson, A.3
  • 111
    • 0028425441 scopus 로고
    • Supervisory Run-to-Run Control of Polysilicon Gate Etch Using In-Situ Ellipsometry
    • May
    • S. Butler and J. Stefani, "Supervisory Run-to-Run Control of Polysilicon Gate Etch Using In-Situ Ellipsometry," IEEE Trans. Semiconduct. Manuf. 7(2) (May 1994).
    • (1994) IEEE Trans. Semiconduct. Manuf. , vol.7 , Issue.2
    • Butler, S.1    Stefani, J.2
  • 112
    • 84889340345 scopus 로고
    • User's Guide for NPSOL (Smoothed Nonlinear Constrained Optimization) (Version 4.0)
    • A Fortran Package for Nonlinear Programming, Stanford Univ., Stanford, CA
    • P. Gill, W. Murray, M. Saunders, and M. Wright, User's Guide for NPSOL (Smoothed Nonlinear Constrained Optimization) (Version 4.0): A Fortran Package for Nonlinear Programming, Stanford Univ., Stanford, CA, 1986.
    • (1986)
    • Gill, P.1    Murray, W.2    Saunders, M.3    Wright, M.4
  • 113
    • 0001881542 scopus 로고
    • The Regression Control Chart
    • Jan.
    • B. Mandel, "The Regression Control Chart," J. Quality Technol. 1(1), 1-9 (Jan. 1969).
    • (1969) J. Quality Technol. , vol.1 , Issue.1 , pp. 1-9
    • Mandel, B.1
  • 114
    • 0004167812 scopus 로고
    • A Primer of Multivariate Statistics
    • Academic Press, New York
    • R. Harris, A Primer of Multivariate Statistics, Academic Press, New York, 1975.
    • (1975)
    • Harris, R.1
  • 115
    • 84889421237 scopus 로고
    • A Strategy for Adaptive Regression Modeling of LPCVD Reactors
    • Special Issues in Semiconductor Manufacturing, 69-80 (Univ. California, Berkeley/ERL M90/8) (Jan.
    • S. Lee, "A Strategy for Adaptive Regression Modeling of LPCVD Reactors," Special Issues in Semiconductor Manufacturing, 69-80 (Univ. California, Berkeley/ERL M90/8) (Jan. 1990).
    • (1990)
    • Lee, S.1
  • 116
    • 0024062307 scopus 로고
    • Multivariate Generalizations of Cumulative Sum Quality-Control Schemes
    • Aug.
    • R. Crosier, "Multivariate Generalizations of Cumulative Sum Quality-Control Schemes," Technometrics 30(3) (Aug. 1988).
    • (1988) Technometrics , vol.30 , Issue.3
    • Crosier, R.1
  • 117
    • 36849135206 scopus 로고
    • Flow of a Viscous Liquid on a Rotating Disk
    • A. Emslie, F. Bonner, and L. Peck, "Flow of a Viscous Liquid on a Rotating Disk," J. Appl. Phys. 29, 858 (1958).
    • (1958) J. Appl. Phys. , vol.29 , pp. 858
    • Emslie, A.1    Bonner, F.2    Peck, L.3
  • 118
    • 33747516570 scopus 로고    scopus 로고
    • The BCAM Control and Monitoring Environment
    • Univ. California Berkeley, M.S. thesis, Memorandum UCB/ERL M92/113
    • B. Bombay, The BCAM Control and Monitoring Environment, Univ. California Berkeley, M.S. thesis, Memorandum UCB/ERL M92/113, 1992.
    • Bombay, B.1
  • 119
    • 0004236492 scopus 로고
    • Matrix Computations
    • 2nd ed., John Hopkins Univ. Press, Baltimore
    • G. Golub and C. Van Loan, Matrix Computations, 2nd ed., John Hopkins Univ. Press, Baltimore, 1989.
    • (1989)
    • Golub, G.1    Van Loan, C.2
  • 120
    • 0031199120 scopus 로고    scopus 로고
    • A General Equipment Diagnostic System and Its Application on Photolithographic Sequence
    • S. Leang and C. Spanos, "A General Equipment Diagnostic System and Its Application on Photolithographic Sequence," IEEE Trans. Semiconduct. Manuf. 10(3) (1997).
    • (1997) IEEE Trans. Semiconduct. Manuf. , vol.10 , Issue.3
    • Leang, S.1    Spanos, C.2
  • 121
    • 0033331287 scopus 로고    scopus 로고
    • Intelligent Control of Via Formation by Photosensitive BCB for MCM-D Applications
    • Nov.
    • T. Kim and G. May, "Intelligent Control of Via Formation by Photosensitive BCB for MCM-D Applications," IEEE Trans. Semiconduct. Manuf. 12(4), 503-515 (Nov. 1999).
    • (1999) IEEE Trans. Semiconduct. Manuf. , vol.12 , Issue.4 , pp. 503-515
    • Kim, T.1    May, G.2
  • 122
    • 0033310510 scopus 로고    scopus 로고
    • Sequential Modeling of Via Formation in Photosensitive Dielectric Materials for MCM-D Applications
    • Aug.
    • T. Kim and G. May, "Sequential Modeling of Via Formation in Photosensitive Dielectric Materials for MCM-D Applications," IEEE Trans. Semiconduct. Manuf. 12(3), 345-352 (Aug. 1999).
    • (1999) IEEE Trans. Semiconduct. Manuf. , vol.12 , Issue.3 , pp. 345-352
    • Kim, T.1    May, G.2
  • 123
    • 0027541118 scopus 로고
    • Automated Malfunction Diagnosis of Semiconductor Fabrication Equipment: A Plasma Etch Application
    • Feb.
    • G. May and C. Spanos, "Automated Malfunction Diagnosis of Semiconductor Fabrication Equipment: A Plasma Etch Application," IEEE Trans. Semiconduct. Manuf. 6(1), 28-40 (Feb. 1993).
    • (1993) IEEE Trans. Semiconduct. Manuf. , vol.6 , Issue.1 , pp. 28-40
    • May, G.1    Spanos, C.2
  • 124
    • 0022990020 scopus 로고
    • Hippocrates: A Methodology for IC Process Diagnosis
    • C. Spanos, "Hippocrates: A Methodology for IC Process Diagnosis," Proc. ICCAD, 1986, pp. 513-516.
    • (1986) Proc. ICCAD , pp. 513-516
    • Spanos, C.1
  • 125
    • 0027702442 scopus 로고
    • MERLIN: A Device Diagnosis System Based on Analytic Models
    • Nov.
    • G. Freeman, W. Lukaszek, and J. Pan, "MERLIN: A Device Diagnosis System Based on Analytic Models," IEEE Trans. Semiconduct. Manuf. 6(4), 306-317 (Nov. 1993).
    • (1993) IEEE Trans. Semiconduct. Manuf. , vol.6 , Issue.4 , pp. 306-317
    • Freeman, G.1    Lukaszek, W.2    Pan, J.3
  • 126
    • 85168902083 scopus 로고
    • PIES: An Engineer's 'Do-it-Yourself' Knowledge System for Interpretation of Parametric Test Data
    • Proc. 5th Nat. Conf. on AI
    • J. Pan and J. Tenenbaum, "PIES: An Engineer's 'Do-it-Yourself' Knowledge System for Interpretation of Parametric Test Data," Proc. 5th Nat. Conf. on AI, 1986, pp. 836-843.
    • (1986) , pp. 836-843
    • Pan, J.1    Tenenbaum, J.2
  • 128
    • 0009412095 scopus 로고
    • Tighter Process Control with Neural Networks
    • J. Plummer, "Tighter Process Control with Neural Networks," AI Expert 10, 49-55 (1993).
    • (1993) AI Expert , vol.10 , pp. 49-55
    • Plummer, J.1
  • 129
    • 0036474729 scopus 로고    scopus 로고
    • Artificial Neural Network Based Diagnosis of CVD Barrel Reactor
    • Feb.
    • S. Bhatikar and R. Mahajan, "Artificial Neural Network Based Diagnosis of CVD Barrel Reactor," IEEE Trans. Semiconduct. Manuf. 15(1), 71-78 (Feb. 2002).
    • (2002) IEEE Trans. Semiconduct. Manuf. , vol.15 , Issue.1 , pp. 71-78
    • Bhatikar, S.1    Mahajan, R.2
  • 130
    • 0032203442 scopus 로고    scopus 로고
    • A Study on Failure Prediction in a Plasma Reactor
    • E. Rietman and M. Beachy, "A Study on Failure Prediction in a Plasma Reactor," IEEE Trans. Semiconduct. Manuf. 11(4), 670-680 (1998).
    • (1998) IEEE Trans. Semiconduct. Manuf. , vol.11 , Issue.4 , pp. 670-680
    • Rietman, E.1    Beachy, M.2
  • 131
    • 0030679222 scopus 로고    scopus 로고
    • Real-Time Diagnosis of Semiconductor Manufacturing Equipment Using Neural Networks
    • Jan.
    • B. Kim and G. May, "Real-Time Diagnosis of Semiconductor Manufacturing Equipment Using Neural Networks," IEEE Trans. Compon. Pack. Manuf. Technol. C20(1), 39-47 (Jan. 1997).
    • (1997) IEEE Trans. Compon. Pack. Manuf. Technol. , vol.C20 , Issue.1 , pp. 39-47
    • Kim, B.1    May, G.2
  • 132
    • 0004209735 scopus 로고
    • A Mathematical Theory of Evidence
    • Princeton Univ. Press, Princeton, NJ
    • G. Shafer, A Mathematical Theory of Evidence, Princeton Univ. Press, Princeton, NJ, 1976.
    • (1976)
    • Shafer, G.1
  • 133
    • 0001844207 scopus 로고
    • Time Series Modeling of Reactive Ion Etching Using Neural Networks
    • Feb.
    • M. Baker, C. Himmel, and G. May, "Time Series Modeling of Reactive Ion Etching Using Neural Networks," IEEE Trans. Semiconduct. Manuf. 8(1), 62-71 (Feb. 1995).
    • (1995) IEEE Trans. Semiconduct. Manuf. , vol.8 , Issue.1 , pp. 62-71
    • Baker, M.1    Himmel, C.2    May, G.3


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