Thin-film optimization strategy in high numerical aperture optical lithography, part 1: Principles

Journal of Microlithography, Microfabrication and Microsystems

Volumn 4, Issue 4, 2005, Pages

  Yu, Shinn Sheng ^a   Lin, Burn J ^a   Yen, Anthony ^a,b   Ke, Chih Ming ^a   Huang, Jacky ^a   Ho, Bang Ching ^a   Chen, Chun Kuang ^a   Gau, Tsai Sheng ^a   Hsieh, Hong Chang ^a   Ku, Yao Ching ^a  

^a TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY   (Taiwan)

^b CYMER INC   (United States)

Author keywords

Critical dimension; Electromagnetic theory; Numerical aperture; Thin films

Indexed keywords

CRITICAL DIMENSION; ELECTROMAGNETIC THEORY; NUMERICAL APERTURE; ANTIREFLECTION COATING; CRITICAL DIMENSION (CD) VARIATION;

ELECTROMAGNETISM; NUMERICAL ANALYSIS; OPTICAL PROPERTIES; THIN FILMS; IMAGE ANALYSIS; MATERIALS SCIENCE; NUMERICAL METHODS; OPTIMIZATION; PHOTOLITHOGRAPHY; POLARIZATION; REFLECTION;

LITHOGRAPHY; THIN FILMS;

EID: 33747587379     PISSN: 15371646     EISSN: None     Source Type: Journal    
DOI: 10.1117/1.2137967     Document Type: Article

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