메뉴 건너뛰기




Volumn 13, Issue 1, 2000, Pages 88-96

Optimal predictive control with constraints for the processing of semiconductor wafers on bake plates

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; ERROR ANALYSIS; FEEDBACK CONTROL; LINEAR PROGRAMMING; MATHEMATICAL MODELS; OPTIMAL CONTROL SYSTEMS; PREDICTIVE CONTROL SYSTEMS; PROCESS CONTROL;

EID: 0033902149     PISSN: 08946507     EISSN: None     Source Type: Journal    
DOI: 10.1109/66.827348     Document Type: Article
Times cited : (38)

References (15)
  • 2
    • 0028547681 scopus 로고
    • Modeling, identification, and control of rapid thermal processing systems
    • C. Schaper, M. Moslehi, K. Saraswat, and T. Kailath, "Modeling, identification, and control of rapid thermal processing systems," J. Electrochemical Soc. , vol. 141, no. 11, pp. 3200-3209, 1994.
    • (1994) J. Electrochemical Soc. , vol.141 , Issue.11 , pp. 3200-3209
    • Schaper, C.1    Moslehi, M.2    Saraswat, K.3    Kailath, T.4
  • 4
  • 5
    • 24644524731 scopus 로고    scopus 로고
    • Control of spatial and transient tempertaure trajectories for photoresist processing
    • submitted for publication
    • K. El-Awady, C. Schaper, and T. Kailath, Control of spatial and transient tempertaure trajectories for photoresist processing, in J. Vacuum Sci. Technol. B, 1999. submitted for publication.
    • (1999) J. Vacuum Sci. Technol. B
    • El-Awady, K.1    Schaper, C.2    Kailath, T.3
  • 11
    • 0003335354 scopus 로고    scopus 로고
    • Resist processing
    • J. R. Sheats and B. W. Smith, Eds New York: Marcel Dekker
    • B. W. Smith, "Resist processing," in Microlithography: Science and Technology, J. R. Sheats and B. W. Smith, Eds New York: Marcel Dekker, 1998.
    • (1998) Microlithography: Science and Technology
    • Smith, B.W.1
  • 13
    • 0027646613 scopus 로고
    • Model identification in rapid thermal processing systems
    • Aug.
    • Y. M. Cho and T. Kailath, "Model identification in rapid thermal processing systems," IEEE Trans. Semiconduct. Manufact, vol. 6, pp. 233-245, Aug. 1993.
    • (1993) IEEE Trans. Semiconduct. Manufact , vol.6 , pp. 233-245
    • Cho, Y.M.1    Kailath, T.2
  • 15
    • 33749891683 scopus 로고    scopus 로고
    • Large dimensional multivariable spatial real-time temperature control and measurement for chemically amplified photoresist processing
    • Santa Clara, CA
    • K. El-Awady and C. Schaper, "Large dimensional multivariable spatial real-time temperature control and measurement for chemically amplified photoresist processing," presented at the SPIE Microelectronic Manufacturing Symposium, Santa Clara, CA, 1999.
    • (1999) SPIE Microelectronic Manufacturing Symposium
    • El-Awady, K.1    Schaper, C.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.