An in situ approach to real-time spatial control of steady-state wafer temperature during thermal processing in microlithography

IEEE Transactions on Semiconductor Manufacturing

Volumn 20, Issue 1, 2007, Pages 5-12

  Tay, Arthur ^a,b   Ho, Weng Khuen ^b   Hu, Ni ^b  

^a IEEE   (Singapore)

^b NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

Microlithography; Photoresist processing; Real time control; Semiconductor manufacturing; Temperature control

Indexed keywords

EMBEDDED SENSORS; PHOTORESIST PROCESSING; SEMICONDUCTOR MANUFACTURING; THERMAL PROCESSING; THERMAL SYSTEMS; WAFER TEMPERATURE;

EMBEDDED SYSTEMS; HEAT TREATMENT; LITHOGRAPHY; PHOTORESISTORS; REAL TIME CONTROL; SAMPLING; TEMPERATURE CONTROL; TEMPERATURE SENSORS;

SILICON WAFERS;

EID: 33847748223     PISSN: 08946507     EISSN: None     Source Type: Journal    
DOI: 10.1109/TSM.2007.890770     Document Type: Article

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