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Volumn 5752, Issue II, 2005, Pages 692-701
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Comprehensive CD uniformity control across lithography and etch
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Author keywords
Across wafer CDU; Critical Dimension uniformity (CDU); Minimax optimization; Multi objective optimization; Multi zone PEB bake plate; Plasma etching signature; Process control; Process modeling; Zone offsets
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Indexed keywords
CONSTRAINED QUADRATIC OPTIMIZATION;
CRITICAL DIMENSION (CD);
CRITICAL DIMENSION UNIFORMITY (CDU);
MINIMAX OPTIMIZATION;
COMPUTER SIMULATION;
CONSTRAINT THEORY;
OPTIMIZATION;
PLASMA ETCHING;
QUADRATIC PROGRAMMING;
LITHOGRAPHY;
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EID: 24644435944
PISSN: 16057422
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1117/12.601087 Document Type: Conference Paper |
Times cited : (17)
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References (7)
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