Chemical manipulation by X-rays of functionalized thiolate self-assembled monolayers on au

Langmuir

Volumn 24, Issue 24, 2008, Pages 13969-13976

  Iqbal, P ^a   Critchley, K ^b   Attwood, D ^c   Tunnicliffe, D ^c   Evans, S D ^d   Preece, J A ^a  

^a UNIVERSITY OF BIRMINGHAM   (United Kingdom)

^b UNIVERSITY OF MICHIGAN   (United States)

^c BAE SYSTEMS   (United Kingdom)

^d UNIVERSITY OF LEEDS   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON CONTENTS; CHEMICAL MANIPULATIONS; FUNCTIONALIZED; PHENYL GROUPS; PHENYL MOIETIES; PHOTOELECTRON PEAKS; SAMS; THIOACETIC ACIDS; THIOLATE; TOTAL CARBONS; X-RAY EXPOSURES; X-RAY IRRADIATIONS; X-RAY PHOTOELECTRON SPECTROSCOPIES; XPS; XPS SPECTRUM;

AMINES; CHEMICAL MODIFICATION; DESORPTION; ELECTRON ENERGY LEVELS; ELECTRONS; ESTERS; HEXANE; IRRADIATION; ORGANIC POLYMERS; PHOTOIONIZATION; PHOTONS; RADIATION; SELF ASSEMBLED MONOLAYERS; X RAYS;

X RAY PHOTOELECTRON SPECTROSCOPY;

GOLD; THIOL DERIVATIVE;

ARTICLE; CHEMICAL STRUCTURE; CHEMISTRY; ELECTRON; PHOTOCHEMISTRY; SPECTROPHOTOMETRY; X RAY;

ELECTRONS; GOLD; MOLECULAR STRUCTURE; PHOTOCHEMICAL PROCESSES; SPECTROPHOTOMETRY; SULFHYDRYL COMPOUNDS; X-RAYS;

EID: 61849145691     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la802244a     Document Type: Article

References (60)

1. Joachim, C.; Uimzewski, J. K.; Aviram, A. Nature 2000, 408, 548.
2. Shipway, A. N.; Katz, E.; Willner, I. ChemPhysChem 2000, 1, 18.
3. Gooding, J. J.; Mearns, F.; Yang, W.; Liu, J. Electroanalysis 2003, 15,81.
4. Love, J. C; Estroff, L. A.; Kriebel, J. K.; Nuzzo, R. G.; Whitesides, G. M. Chem. Rev. 2005, 105, 1103.
5. De Smet, L. C. P. M.; Zuilhof, H.; Sudhölter, E. J. R.; Lie, L. H.; Houlton, A.; Horrocks, B. R. J. Phys. Chem. B 2005, 109, 12020.
6. Laibinis, P. E.; Whitesides, G. M. J. Am. Chem. Soc. 1992, 114, 9022.
7. Rieke, P. C.; Baer, D. R.; Fryxell, G. E.; Engelhard, M. H.; Porter, M. S. J. Vac. Sci. Technol. A 1993, 11, 2292.
8. Olsen, C; Rowntree, P. A. J. Chem. Phys. 1998, 108, 3751.
9. Kondoh, H.; Nozoye, H. J. Phys. Chem. B 1998, 102, 2367.
10. Khan, K. A.; Camillone, N., III.; Osgood, R. M., Jr. J. Chem. Phys. 1999, 110, 10527.
11. Eck, W.; Stadler, W.; Geyer, W.; Zharnikov, M.; Gölzhäuser, A.; Grunze, M. Adv. Mater. 2000, 12, 805.
12. Brandow, S. L.; Chen, M.-S.; Aggarwal, R., Dulcey, C. S.; Calvert, J. M.; Dressick, W. J. Langmuir 1999, 15, 5429.
13. Lee, K.; Pan, F.; Carrol, G. T.; Turro, N. J.; Koberstein, J. T. Langmuir 2004, 20, 1812.
14. Graham, R. L.; Bain, C. D.; Biebuyck, H. A.; Laibinis, P. E.; Whitesides, G. M. J. Phys. Chem. 1993, 97, 9456.
15. Fryman, E.; Cohen, H.; Maoz, R.; Sagiv, J. Langmuir 1997, 13, 5089.
16. Dressick, W. J.; Dulcey, C. S.; Brandow, S. L.; Witschi, H.; Neeley, P. F. J. Vac. Sci. Technol., A 1999, 17, 1432.
17. Kim, T. K.; Yang, M.; Peters, R. D.; Sohn, B. H.; Nealey, P. F. J. Phys. Chem. B 2000, 104, 7403.
18. Heister, K.; Zharnikov, M.; Johansson, L. S. O.; Ulman, A.; Grunze, Z. Langmuir 2001, 17, 8.
19. Mendes, P. M.; Preece, J. A. Curr. Opin. Colloid Interface Sci. 2004, 9, 236.
20. Troughton, E. B.; Bain, C. D.; Whitesides, G. M.; Nuzzo, R. G.; Allara, D. L.; Porter, M. D. Langmuir 1988, 4, 365.
21. Cooper, E.; Parker, L.; Scotchford, C. A.; Downes, S.; Leggett, G. J.; Parker, T. L. J. Mater. Chem. 2000, 10, 133.
22. Mendez, S.; Ista, L. K.; López, G. P. Langmuir 2003, 19, 8115.
23. Siqueira Petri, D. F.; Wenz, G.; Schunk, P.; Schimmel, T. Langmuir 1999, 15, 4520.
24. Chen, S.; Li, L.; Boozer, C. L.; Jiang, S. Langmuir 2000, 16, 9287.
25. Schlenoff, J. B.; Li, M.; Ly, H. J. Am. Chem. Soc. 1995, 117, 12538.
26. Callow, J. A.; Callow, M. E.; Ista, L. K.; Lopez, G.; Chandhury, M. K. J. R. Soc. Interface 2005, 2, 319.
27. Lee, S.; Puck, A.; Graupe, M.; Colorado Jr., R.; Shon, Y.-S.; Lee, T. R.; Perry, S. S. Langmuir 2001, 17, 7364.
28. Smith,D. A.; Zhang, J.; Kirkham, J.; Robinson, C; Marsh, A.; Wallwork, M, L. J. Phys. Chem. B 2000, 104, 8862.
29. Iqbal, P.; Critchley, K.; Bowen, J.; Attwood, D.; Tunnicliffe, D.; Evans, S. D.; Preece, J. A. J. Mater. Chem. 2007, 17, 5097.
30. Vakarelski,I. U.; Brown, S. C.; Rabinovich, Y. L.; Moudgil, M. Langmuir 2004, 20, 1724.
31. Zuo, L.; Xiong, Y.; Xie, X.; Xiao, X. J. Phys. Chem. B 2005, 109,22971.
32. Moon, J. H.; La, Y.-H.; Shim, J. Y.; Hong, B. J.; Kim, K. J.; Kang, T.-H; Kim, B.; Kang, H.; Park, J. W. Langmuir 2000, 16, 2981.
33. Gölzhäuser, A.; Eck, W.; Geyer, W.; Stadler, V.; Weimann, T.; Hinze, P.; Grunze, M. Adv. Mater. 2001, 13, 806.
34. Geyer, W.; Stadler, V.; Eck, W.; Gölzhäuser, A.; Sauer, M.; Weimann, T.; Hinze, P.; Grunze, M. J. Vac. Sci. Technol., B 2001, 19, 2732.
35. Diegoli, S.; Hamlett, C. A. E.; Leigh, S. J.; Mendes, P. M.; Preece, J. A. Proc. IMechE 2007, 221, 589.
36. (a) La, Y.-H.; Kim, H. J.; Maeng, S.; Jung, Y. J.; Kang, T.-H.; Ihm, K.; Kim, K.-J.; Kim, B.; Park, J. W. Langmuir 2002, 18, 301.
37. La, Y.-H.; Kim, H. J.; Maeng, S.; Jung, Y. J.; Kang, T.-H.; Ihm, K.; Kim, K.-J.; Kim, B.; Park, J. W. Langmuir 2002, 18, 2430.
38. Schmelmer,U.; Jordan, R.; Geyer, W.; Eck, W.; Gölzhäuser, A.; Grunze, M.; Ulman, A. Angew. Chem., Int. Ed. 2003, 42, 559,
39. Biebricher, A.; Paul, A.; Tinnefeld, P.; Gölzhäuser, A.; Sauer, M. J. Biotechnol. 2004, 112, 97.
40. Mendes, P. M.; Belloni, M.; Ashworth, M.; Hardy, C.; Nikitin, K.; Fitzmaurice, D.; Critchley, K.; Evans, S.; Preece, J. A. ChemPhysChem 2003, 4, 884.
41. La, Y.-H.; Jung, Y. J.; Kim, H. J.; Kang, T.-H.; Ihm, K.; Kim, K.-J.; Kim, B.; Park, J. W. Langmuir 2003, 19, 4390.
42. Zharnikov, M.; Shaporenko, P. A.; Gölzhäuser, A.; Scholl, A. J. Phys. Chem. B 2005, 109, 5168.
43. Ada, E. T.; Etchin, S.; Melngailis, J.; Dressick, W. J.; Chen, M.-S.; Calvert, J.; Hanley, L. J. Vac. Sci. Technol., B 1995, 13, 2189.
44. Geyer, W.; Stadler, V.; Eck, W.; Gölzhäuser, A.; Grunze, M. Appl. Phys. Lett. 1999, 75, 2401.
45. Weimann, T.; Geyer, W.; Hinze, P.; Stadler, V.; Eck, W.; Gölzhäuser, A. Microelectron. Eng. 2001, 57-58, 903.
46. Felgenhauer, T.; Yan, C.; Geyer, W.; Rong, H.-T.; Buck, M.; Gölzhäuser, A. Appl. Phys. Lett. 2001, 79, 3323.
47. Kaltenpoth, G.; Völkel, B.; Nottbohm, C. T.; Buck, M,; Gölzhäuser, A. J. Vac. Sci. Technol., B 2002, 20, 2734.
48. Küller, A.; Stadler, V.; Geyer, W.; Gölzhäuser, A. Appl. Phys. Lett. 2003, 82, 3776.
49. Küller, A.; El-Desawy, M. A.; Stadler, V.; Geyer, W.; Eck, W.; Gölzhäuser, A. J. Vac. Sci. Technol., B 2004, 22, 1114.
50. Heister, K.; Frey, S.; Gölzhäuser, A.; Ulman, A.; Zharnikov, M. J. Phys. Chem. B 1999, 103, 11098.
51. Zharnikov, M.; Frey, S.; Heister, K.; Grunze, M. Langmuir 2000, 16, 2697.
52. Müller, H. U.; Zharnikov, M.; Völkel, B.; Schertel, A.; Harder, P.; Grunze, M. J. Phys. Chem. B 1998, 102, 7949.
53. Gryko, D. T.; Clausen, C.; Roth, K. M.; Dontha, N.; Bocian, D. F.; Kuhr, W. G., Lindsey, J. S. J. Org. Chem. 2000, 65, 7345.
54. Rang, J. F.; Ulman, A.; Liao, S.; Jordon, R.; Yang, G.; Gang-Yu, L. Langmuir 2001, 17, 95.
55. Evans, S. D.; Urankar, E.; Ulman, A.; Ferris, N. J. Am. Chem. Soc. 1991, 113, 4121.
56. Bain, C. D.; Troughton, E. B.; Tao, Y.-T.; Evall, J.; Whitesides, G. M.; Nuzzo, R. G. J. Am. Chem. Soc. 1989, 111,321.
57. Arnold, R.; Azzam, W.; Terfort, A.; Wöll, C. Langmuir 2002, 18, 3980.
58. Wang, H.; Chen, S.; Li, L.; Jiang, S. Langmuir 2005, 21, 2633.
59. Moulder, J. F., Stickle, W. F., Sobol, P. E. and Bomben, K. D. Handbook of X-ray Photoelectron Spectroscopy: A Reference Book of Standard Spectra for Identification and Interpretation of X-ray Data;Perkin-Elmer Corporation Physical Electronics Division: Minnesota, MN, 1972; pp 40-41.
60. http//srdata.nist.gov/xps/index.htm.