A novel example of X-ray-radiation-induced chemical reduction of an aromatic nitro-group-containing thin film on SiO2 to an aromatic amine film

ChemPhysChem

Volumn 4, Issue 8, 2003, Pages 884-889

  Mendes, Paula ^a   Belloni, Maura ^a   Ashworth, Mark ^a   Hardy, Chris ^a   Nikitin, Kirill ^b   Fitzmaurice, Donald ^b   Critchley, Kevin ^c   Evans, Stephen ^c   Preece, Jon ^a  

^a UNIVERSITY OF BIRMINGHAM   (United Kingdom)

^b UNIVERSITY COLLEGE DUBLIN   (Ireland)

^c UNIVERSITY OF LEEDS   (United Kingdom)

Author keywords

Chemical modification; Nanostructures; Nitro group; Organic film; SiO; X ray photoelectron spectroscopy

Indexed keywords

AMINES; AROMATIC COMPOUNDS; CHEMICAL MODIFICATION; CHLORINE COMPOUNDS; FILM PREPARATION; MULTILAYERS; NANOSTRUCTURES; NITROGEN OXIDES; PHOTOELECTRONS; PHOTONS; SILICA; SILICON OXIDES; SILICON WAFERS; X RAY PHOTOELECTRON SPECTROSCOPY;

AROMATIC AMINES; CHEMICAL REDUCTION; NITRO GROUP; ORGANIC FILMS; SELF ASSEMBLED FILMS; SELF ASSEMBLED MULTILAYERS; X RAY IRRADIATION; X RAY RADIATION;

TIN COMPOUNDS;

AMINE; AMMONIA; AROMATIC NITRO COMPOUND; NITROUS OXIDE; SILICON DIOXIDE;

ARTICLE; CHEMICAL ANALYSIS; FILM; REACTION ANALYSIS; REDUCTION; SYNTHESIS; X IRRADIATION; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 0042330964     PISSN: 14394235     EISSN: None     Source Type: Journal    
DOI: 10.1002/cphc.200300699     Document Type: Article

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