Nanoscale patterning of self-assembled monolayers by e-beam lithography

Microelectronic Engineering

Volumn 57-58, Issue , 2001, Pages 903-907

  Weimann, T ^a   Geyer, W ^a   Hinze, P ^a   Stadler, V ^a   Eck, W ^a   Golzhauser A ^a  

^a PHYSIKALISCH TECHNISCHE BUNDESANSTALT   (Germany)

Author keywords

e beam lithography; Nanostructure; Self assembled monolayer

Indexed keywords

CROSSLINKING; ELECTRON BEAM LITHOGRAPHY; GOLD; NANOSTRUCTURED MATERIALS;

NANOSCALE PATTERNING;

SELF ASSEMBLY;

EID: 0035450044     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(01)00454-3     Document Type: Article

References (13)