Microstructure, mechanical properties, and oxidation resistance of nanocomposite Ti-Si-N coatings

Applied Surface Science

Volumn 252, Issue 18, 2006, Pages 6141-6153

  Zhang, C H ^a   Lu, X C ^a   Wang, H ^a   Luo, J B ^a   Shen, Y G ^b   Li, K Y ^b  

^a TSINGHUA UNIVERSITY   (China)

^b CITY UNIVERSITY OF HONG KONG   (Hong Kong)

Author keywords

Cutting performance; Mechanical properties; Oxidation resistance; Ti Si N coating

Indexed keywords

COATINGS; MICROSTRUCTURE; NANOSTRUCTURED MATERIALS; OXIDATION RESISTANCE; SCANNING ELECTRON MICROSCOPY; SILICON WAFERS; STAINLESS STEEL; X RAY PHOTOELECTRON SPECTROSCOPY;

CUTTING PERFORMANCE; SI(1 0 0) WAFER; TI-SI-N COATING;

TITANIUM ALLOYS;

EID: 33746253274     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2005.04.056     Document Type: Article

References (22)

1. Mayrhofer P.H., Tischler G., and Mitterer C. Surf. Coat. Technol. 142 (2001) 78
2. Lee B.H., and Yong K. J. Vac. Sci. Technol. B 22 (2004) 2375
3. Buhl R., Pulker H.K., and Moll E. Thin Solid Films 80 (1981) 265
4. Fouilland L., Imhoff L., Bouteville A., Benayoun S., Remy J.C., Perriere J., and Morcrette M. Surf. Coat. Technol. 100/101 (1998) 146
5. Choi J.B., Cho K., Kim Y., Kim K.H., and Song P.K. Jpn. J. Appl. Phys. 42 (2003) 6556
6. Veprek S., and Reiprich S. Thin Solid Films 268 (1995) 64
7. Lee E.-A., and Kim K.H. Thin Solid Films 420/421 (2002) 371
8. Zhang C.H., Luo J.B., Li W.Z., and Chen D.R. J. Tribol. 125 (2003) 445
9. Rebouta L., Tavares C.J., Aimo R., Wang Z., Pischow K., Alves E., Rojas T.C., and Odriozola J.A. Surf. Coat. Technol. 133/134 (2000) 234
10. Wang D.Y., and Chang C.L. Thin Solid Films 392 (2001) 11
11. Oliver W.C., and Pharr G.M. J. Mater. Res. 7 (1992) 1564
12. Heinke W., Leyland A., Matthews A., Berg G., Friedrich C., and Broszeit E. Thin Solid Films 270 (1995) 431
13. Powder Diffraction File (PDF) Card, No. 38-1420.
14. Li Z.G., Miyake S., Kumagai M., Sarto H., and Muramatsu Y. Jpn. J. Appl. Phys. 42 (2003) 7510
15. Taylor J.A., Lancaster G.M., Ignatiev A., and Rabalais J.W. J. Chem. Phys. 68 (1978) 1776
16. Endle J.P., Sun Y.M., White J.M., and Ekerdt J.G. J. Vac. Sci. Technol., A 16 (1998) 1262
17. Zhang C.H., Liu Z.-J., Li K.Y., Shen Y.G., and Luo J.B. J. Appl. Phys. 95 (2004) 1460
18. Zhang C.H., Luo J.B., Li W.Z., and Chen D.R. Acta Phys. Sin. 53 (2004) 182
19. Veprek S., Reiprich S., and Li Shizhi. Appl. Phys. Lett. 66 (1995) 2640
20. Kim K.H., and Park B.H. Chem. Vap. Deposition 5 (1999) 275
21. Mclntyre D., Greene J.E., Hakansson G., Sundgren J.-E., and Munz W.-D. J. Appl. Phys. 67 (1990) 1542
22. Huang C.T., and Duh J.G. Surf. Coat. Technol. 81 (1996) 164