Integrated high-frequency inductors using amorphous electrodeposited Co-P core

IEEE Transactions on Magnetics

Volumn 38, Issue 5 II, 2002, Pages 3498-3500

  Ruythooren, W ^b,c   Beyne, E ^a,c   Celis, J P ^b   De Boeck, J ^c  

^a IEEE

^b UNIVERSITY OF LEUVEN   (Belgium)

^c IMEC   (Belgium)

Author keywords

Amorphous materials; Magnetic devices; Permeability

Indexed keywords

AMORPHOUS MATERIALS; ELECTRIC CONDUCTIVITY; ELECTRIC WINDINGS; ELECTRODEPOSITION; INDUCTANCE; MAGNETIC CORES; MAGNETIC PERMEABILITY; MULTICHIP MODULES;

MINIATURIZATION;

ELECTRIC INDUCTORS;

EID: 0036757807     PISSN: 00189464     EISSN: None     Source Type: Journal    
DOI: 10.1109/TMAG.2002.802738     Document Type: Article

References (14)

1. J.Y. Park, L.K. Lagorce, and M.G. Allen, "Ferrite-based integrated planar inductors and transformers fabricated at low temperature," IEEE Trans. Magn., vol. 33, pp. 3322-3324, Sept. 1997.
2. L. Daniel, C.R. Sullivan, and S.R. Sanders, "Design of microfabricated inductors," in 27th Annu. IEEE Power Electronics Specialists Conf., New York, 1996, pp. 1447-1455.
3. M. Xu, M.T. Liakopoulos, and C.H. Ahn, "A microfabricated transformer for high-frequency power or signal conversion," IEEE Trans. Magn., vol. 34, pp. 1369-1371, July 1998,
4. M. Ohnmacht, V. Seidermann, and S. Buttgenbach, "Microcoils and microrelays-An optimized multilayer fabrication process," Sens. ActuatorsA, Phys., vol. 83, pp. 124-129, 2000.
5. C.R. Sullivan and S.R. Sanders, "Design of microfabricated transformers and inductors for high-frequency power conversion," IEEE Trans. Magn., vol. 11, pp. 228-238, Mar. 1996.
6. C.H. Ahn and M.G. Allen, "A new toroidal-meander type integrated inductor with multilevel meander magnetic core," IEEE Trans. Magn., vol. 30, pp. 73-79, Jan. 1994.
7. W. Ruythooren, K. Attenborough, S. Beerten, P. Merken, J. Fransaer, E. Beyne, C. Van Hoof, J. De Boeck, and J.-P. Celis, "Electrodeposition for the synthesis of microsystems," J. Micromech. Microeng., vol. t0, pp. 101-107, 2000.
8. J. Vaes, J. Fransaer, and J.-P. Celis, "The role of metal hydroxides in NiFe deposition," J. Electrochem. Soc., vol. 147, pp. 3718-3724, Oct. 2000.
9. G. Dietz and K. Klett, "Electrodeposited amorphous Co-P alloys with high permeability," J. Magn. Magn. Mater., vol. 8, pp. 57-60, 1978.
10. W. Ruythooren, E. de Wit, J. De Boeck, and J.-P. Celis, "Electrode-posited CoP: Structural and magnetic properties," in Proc. 198th Meeting Electrochemical Soc., Phoenix, AZ, Oct. 2000.
11. C.H. Ahn and M.G. Allen, "Micromachined planar inductors on silicon wafers for MEMS applications," IEEE Trans. Ind. Electron., vol. 45, pp. 866-876, Dec. 1998.
12. E. Beyne, R. Van-Hoof, F. Christiaens, J. Roggen, J. Van-Puymbroeck, M. Heerman, G. Gouwy, and R. Bulcke, "CIMD, a technology for high density integration of electronic systems," in Proc. 27th Int. Symp. Microelectronics, Reston, VA, 1994, pp. 226-231.
13. A. Brenner, D.E. Conch, and E. Kellog Williams, J. Res. Natl. Bur. Stand., vol. 44, pp. 109-122, 1950.
14. J.P.C. Bernards, A.E.T. Kuiper, H.J. de Wit, and E. van de Riet, "Pitfalls in the determination of magnetic permeability," IEEE. Trans. Magn., vol. 30, no. 6, pp. 4587-4589, 1994.