Study on surface modification of indium tin oxide and resist surfaces using CF4/O2 plasma for manufacturing organic light-emitting diodes by inkjet printing

Japanese Journal of Applied Physics

Volumn 47, Issue 12, 2008, Pages 8935-8942

  Ikagawa, Masakuni ^a,c   Tohno, Ichiro ^a   Shinmura, Tadashi ^a   Takagi, Shigeyuki ^a   Kataoka, Yoshinori ^b   Fujihira, Masamichi ^c  

^a TOSHIBA CORPORATION   (Japan)

^b SED Inc   (Japan)

^c TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Hydrophilic; Hydrophobic; Indium tin oxide; Inkjet printing; Organic light emitting diodes; Plasma modification

Indexed keywords

CURRENT DENSITY; DIODES; GAS MIXTURES; HIGH PERFORMANCE LIQUID CHROMATOGRAPHY; HYDROPHILICITY; HYDROPHOBICITY; INDIUM; INDUCTIVELY COUPLED PLASMA; LIGHT EMISSION; LIGHT EMITTING DIODES; MASS SPECTROMETRY; ORGANIC LIGHT EMITTING DIODES (OLED); OXYGEN; PHOTOELECTRON SPECTROSCOPY; PHOTOLITHOGRAPHY; PLASMAS; PRINTING; SPECTRUM ANALYSIS; SURFACE TREATMENT; TIN; TITANIUM COMPOUNDS; X RAY PHOTOELECTRON SPECTROSCOPY;

HYDROPHILIC; HYDROPHOBIC; INDIUM TIN OXIDE; INKJET PRINTING; ORGANIC LIGHT-EMITTING DIODES; PLASMA MODIFICATION;

PLASMA DIODES;

EID: 59349086981     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.47.8935     Document Type: Article

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