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Volumn 46, Issue 10 A, 2007, Pages 6814-6816

Characterization of CF4 plasma-treated indium-tin-oxide surfaces used in organic light-emitting diodes by X-ray photoemission spectroscopy

Author keywords

Chemical composition; Fluorine; Organic light emitting diodes; Plasma treatment; X ray photoemlssion spectroscopy

Indexed keywords

CHEMICAL ANALYSIS; FLUORINE; ORGANIC LIGHT EMITTING DIODES (OLED); PLASMA APPLICATIONS; TIN OXIDES; X RAY PHOTOELECTRON SPECTROSCOPY;

CHEMICAL COMPOSITION; INDIUM TIN OXIDE (ITO); ITO SURFACE; PLASMA TREATMENT;

INDIUM COMPOUNDS;

EID: 35348857398 PISSN: 00214922 EISSN: 13474065 Source Type: Journal
DOI: 10.1143/JJAP.46.6814 Document Type: Article

Times cited : (6)

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