Study on fluorine-doped indium oxide films deposited by reactive evaporating in CF4/O2 gases

Materials Science and Engineering: B

Volumn 90, Issue 1-2, 2002, Pages 196-200

  Ning, Zhaoyuan ^a   Cheng, Shanhua ^a   Huang, Feng ^a   Bian, Yanbin ^a   Luo, Xiaohun ^a  

^a SOOCHOW UNIVERSITY   (China)

Author keywords

F doping; ITO film; Plasma enhanced evaporating

Indexed keywords

ANNEALING; CRYSTALLIZATION; DOPING (ADDITIVES); ELECTRIC CONDUCTIVITY; EVAPORATION; FLUORINE; INDIUM COMPOUNDS;

PLASMA ENHANCED EVAPORATING;

THICK FILMS;

EID: 0037034702     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-5107(01)00944-8     Document Type: Article

References (8)