Micro/nanoimprinting of glass under high temperature using a CVD diamond mold

Journal of Micromechanics and Microengineering

Volumn 18, Issue 6, 2008, Pages

  Komori, M ^a   Uchiyama, H ^a   Takebe, H ^b   Kusuura, T ^c   Kobayashi, K ^a   Kuwahara, H ^d   Tsuchiya, T ^a  

^a KYOTO UNIVERSITY   (Japan)

^b EHIME UNIVERSITY   (Japan)

^c TechnoProducer Corporation   (Japan)

^d RESEARCH INSTITUTE FOR APPLIED SCIENCES   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ADHESION; BUILDING MATERIALS; CARBON NITRIDE; CLARIFICATION; CRYSTAL GROWTH; DIAMONDS; FOCUSED ION BEAMS; FORMING; GLASS; GLASS CERAMICS; GRAIN BOUNDARIES; MOLDING; MOLDS; NITRIDES; SILICON; THEOREM PROVING;

ADHESION TESTS; CHEMICAL VAPOR DEPOSITION DIAMONDS; CVD DIAMONDS; GLASS MATERIALS; GLASSY CARBONS; HIGH TEMPERATURE USING; MOLD FABRICATIONS; MOLD MATERIALS; MOLDING CONDITIONS; MOLDING PROCESSES; MOLDING TEMPERATURES; NITRIDE CERAMICS; PATTERN SIZES; SELECTION METHODS; SURFACE CONDITIONS; TEMPERATURE CONDITIONS;

CHEMICAL VAPOR DEPOSITION;

EID: 57249101859     PISSN: 09601317     EISSN: 13616439     Source Type: Journal    
DOI: 10.1088/0960-1317/18/6/065013     Document Type: Conference Paper

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