Effect of photoacid generator structure on deep ultraviolet resist performance

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 18, Issue 5, 2000, Pages 2543-2550

  Ablaza, Sheri L ^a   Cameron, James F ^a   Xu, Guangyu ^a   Yueh, Wang ^a  

^a SHIPLEY COMPANY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; CHROMOPHORES; DISSOLUTION; LIGHT ABSORPTION; LOW TEMPERATURE OPERATIONS; REACTION KINETICS; ULTRAVIOLET RADIATION;

DEEP ULTRAVIOLET RESISTS; PHOTOACID GENERATORS;

PHOTORESISTS;

EID: 0034268583     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1288136     Document Type: Article

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