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Surface and Coatings Technology

Volumn 166, Issue 1, 2003, Pages 44-50

Annealing effect on ITO thin films prepared by microwave-enhanced dc reactive magnetron sputtering for telecommunication applications

(2) Meng, Li Jian a Placido, Frank b

a INSTITUTO SUPERIOR DE ENGENHARIA DO PORTO (Portugal)

b UNIVERSITY OF THE WEST OF SCOTLAND (United Kingdom)

Author keywords

Anneling; Indium tin oxide (ITO); Microwave enhanced reactive magnetron sputtering; Telecommunication; Transparent conducting oxide films

Indexed keywords

ANNEALING; DEPOSITION; GLASS; INDIUM COMPOUNDS; MAGNETRON SPUTTERING; OXYGEN; PARTIAL PRESSURE; SUBSTRATES;

GLASS SUBSTRATES;

THIN FILMS;

FILM;

EID: 0037416661 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/S0257-8972(02)00767-3 Document Type: Article

Times cited : (68)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.