Study on crystallinity of tin-doped indium oxide films deposited by DC magnetron sputtering

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 37, Issue 4 SUPPL. A, 1998, Pages 1870-1876

  Song, Pung Keun ^c   Shigesato, Yuzo ^a   Yasui, Itaru ^c   Ow Yang, Cleva W ^b   Paine, David C ^b  

^a AOYAMA GAKUIN UNIVERSITY   (Japan)

^b Brown University   (United States)

^c INSTITUTE OF INDUSTRIAL SCIENCE   (Japan)

Author keywords

Amorphous ITO; Crystallinity; dc magnetron sputtering; Low substrate temperature; Reactive sputtering; Tin doped indium oxide; X ray diffraction

Indexed keywords

AMORPHOUS FILMS; CRYSTAL STRUCTURE; MAGNETRON SPUTTERING; SEMICONDUCTING INDIUM COMPOUNDS; SEMICONDUCTOR DOPING; SPUTTER DEPOSITION; TIN; X RAY CRYSTALLOGRAPHY;

INDIUM OXIDE; KINETIC ENERGY;

SEMICONDUCTING FILMS;

EID: 0032046806     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.37.1870     Document Type: Article

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