Investigations on oxygen diffusion in annealing processes of non-stoichiometric amorphous indium tin oxide thin films

Thin Solid Films

Volumn 513, Issue 1-2, 2006, Pages 319-324

  Neubert, T ^a   Neumann, F ^a   Schiffmann, K ^a   Willich, P ^a   Hangleiter, A ^b  

^a FRAUNHOFER INSTITUTE FOR SURFACE ENGINEERING AND THIN FILMS IST   (Germany)

^b TECHNICAL UNIVERSITY OF BRAUNSCHWEIG   (Germany)

Author keywords

Crystallization; Heat treatment; Indium tin oxide; Oxidation; Secondary ion mass spectroscopy; X ray diffraction

Indexed keywords

ANNEALING; CRYSTALLIZATION; HEAT TREATMENT; INDIUM COMPOUNDS; OXIDATION; OXYGEN; SECONDARY ION MASS SPECTROMETRY; THIN FILMS;

BINDING STATES; INDIUM TIN OXIDE; LASER HEATING; OXYGEN CONCENTRATION;

DIFFUSION;

EID: 33745235061     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2006.02.007     Document Type: Article

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