Remote hydrogen microwave plasma CVD of silicon carbonitride films from a tetramethyldisilazane source. Part 1: Characterization of the process and structure of the films

Chemical Vapor Deposition

Volumn 13, Issue 11, 2007, Pages 595-600

  Wrobel, Aleksander M ^a   Blaszczyk Lezak, Iwona ^a  

^a CENTRE OF MOLECULAR AND MACROMOLECULAR STUDIES   (Poland)

Author keywords

Film structure; Film surface morphology; RPCVD; Silicon carbonitride film; Tetramethyldisilazane precursor

Indexed keywords

ADSORPTION; ARRHENIUS PLOTS; AUGER ELECTRON SPECTROSCOPY; CARBON NITRIDE; CHEMICAL VAPOR DEPOSITION; ELECTROMAGNETIC WAVES; FILM GROWTH; FILMS; FORMING; FOURIER TRANSFORM INFRARED SPECTROSCOPY; FOURIER TRANSFORMS; HYDROGEN; INFRARED SPECTROSCOPY; MICROWAVES; NETWORK PROTOCOLS; NITRIDES; NONMETALS; PLASMAS; SENSOR NETWORKS; SILICON; SILICON COMPOUNDS; SUBSTRATES; SURFACE ROUGHNESS; SURFACE STRUCTURE; SURFACES;

ATOMIC FORCES; CARBONITRIDE; CHEMICAL COMPOSITIONS; CHEMICAL STRUCTURES; FILM STRUCTURE; FILM-FORMING; FOURIER TRANSFORM INFRARED; GROWTH SURFACES; GROWTH YIELDS; HOMOGENEOUS MATERIALS; MICROWAVE PLASMA CVD; MICROWAVE PLASMAS; N FILMS; NETWORK STRUCTURES; ORGANIC GROUPS; RPCVD; SILICON CARBONITRIDE FILM; SILICON CARBONITRIDE FILMS; SUBSTRATE TEMPERATURES; TETRAMETHYLDISILAZANE PRECURSOR;

SURFACE MORPHOLOGY;

EID: 54949146489     PISSN: 09481907     EISSN: 15213862     Source Type: Journal    
DOI: 10.1002/cvde.200706586     Document Type: Article

References (35)

1. R. Riedel, H. Kleebe, H. Schonfelder, F. Aldinger, Nature 1995, 374, 526.
2. A. Badzian, T. Badzian, W. D. Drawl, R. Roy, Diamond Relat. Mater. 1998, 7, 1519.
3. A. Badzian, T. Badzian, R. Roy, W. D. Drawl, Thin Solid Filma 1999, 354, 148.
4. A. Badzian, J. Am. Ceram. Soc. 2002, 85, 16.
5. Y. B. Bae, H. Du, B. Gallois, K. E. Gonsalves, B. J. Wilkens, Chem. Mater. 1992, 4, 478.
6. A. Izumi, K. Oda, Thin Solid Films 2006, 501, 195.
7. R. Heyner, G. Marx, Thin Solid Films 1995, 258, 14.
8. G. Marx, K. U. Korner, P. Hager, Steel Res. 2001, 72, 518.
9. D. H. Kuo, D. G. Yang, Thin Solid Films 2000, 374, 92.
10. D. Probst, H. Hocho, Y. Zhou, R. Häuser, T. Stelzner, H. Scheerer, E. Broszeit, C. Berger, R. Riedel, H. Stafast, E. Koke, Surf Coat. Technot. 2005, 200, 355.
11. T. Stelzner, M. Arnold, F. Falk, H. Stafast, D. Probst, H. Hoche, Surf. Coat. Technol. 2005, 200, 372.
12. Y. Zhou, D. Probst, A. Thissen, E. Koke, R. Riedel, R. Hauser, H. Hochs, E. Broszeit, P. Kroll, H. Stafast, J. Eur. Ceram. Soc. 2006, 26, 1325.
13. R. Di Mundo, R. d'Agostino, F. Fracassi, F. Palumbo, Plasma Process. Polym. 2005, 2, 612.
14. N. I. Fainer, Y. M. Rumyantsev, M. L. Kosinova, G. S. Yurjev, E. A. Maximovski, F. A. Kuznetsov, Appl. Surf. Sci. 1997, 114, 614.
15. N. I. Fainer, M. L. Kosinova, Y. M. Rumyantsev, F. A. Kuznetsov, J. Phys. IV 1999, 9, 769.
16. M. L. Kosinova, N. I. Fainer, Y. M. Rumyantsev, M. Terauchi, K. Shibata, F. Satoh, F. A. Kuznelsov, J. Phys. IV 2001, 11, 987.
17. N. I. Fainer, Y. M. Rumyantsev, A. N. Golubenko, M. L. Kosinova, F. A. Kuznetsov, J. Cryst. Growth 2003, 248, 175.
18. T. P. Smirnova, A. M. Badalian, V. O. Borisov, L. V. Yakovkina, V. V. Kaichev, A. N. Shmakov, A. V. Nartova, V. I. Rakhlin, A. N. Fomina, J. Structural Chem. 2003, 44, 169.
19. T. P. Smirnova, A. M. Badalian, L. V. Yakovkina, V. V. Kaichev, V. I. Bukhliyarov, A. N. Shmakov, I. P. Asanov, V. I. Rachlin, A. N. Fomina, Thin Solid Films 2003, 429, 144.
20. A. M. Wrobel, I. Blaszczyk, A. Walkiewicz-Pietrzykowska, A. Tracz, J. E. Klemberg-Sapieha, T. Aoki, Y. Hatanaka, J. Mater. Chem. 2003, 13, 731.
21. A. M. Wrobel, I. Blaszczyk-Lezak, A. Walkiewicz-Pietrzykowska, D. M. Bielinski, T. Aoki, Y. Hatanaka, J. Electrochem. Soc. 2004, 151, C723.
22. T. Aoki, T. Ogishima, A. M. Wrobel, Y. Nakanishi, Y. Hatanaka, Vacuum 1998, 51, 747.
23. I. Blaszczyk-Lezak, A. M. Wrobel, M. P. M. Kivitorma, I. J. Vayrynen, Chem. Vap. Deposition 2005, 11, 44.
24. H. Yasuda, Plsma Polymerization, Academic, Orlando, FL1985, Ch. 6, pp 169-171.
25. A. M. Wrobel, A. Walkiewicz-Pietrzykowska, Chem. Vap. Deposition 1998, 4, 133.
26. G. B. Raupp, F. A. Shemansky, T. S. Cale, J. Vac. Sci. Technol. B, 1992, 10, 2422.
27. I. Blaszczyk-Lezak, A. M. Wrobel, T. Aoki, Y. Nakanishi, I. Kucinska, A. Tracz, Thin Solid Films 2006, 497, 24.
28. A. M. Wrobel, S. Wickramanayaka, Y.Nakanishi, Y. Hatanaka, S. Pawlowski, W. Olejniczak, Diamond Relut. Mater. 1997, 6, 1081.
29. A. M. Wrobel, A. Walkiewicz-Pietrzykowska, J. E. Klemberg-Sapieha, Y. Halanaka, T. Aoki, Y. Nakanishi, J. Appl. Polym. Sci. 2002, 86, 1445.
30. D. R. Anderson, in Analysis of Silicones (Ed: A. L. Smith), Wiley-Inlerscience, New York 1974, Ch. 10.
31. G. Sokrates, Infrared Characteristics Group Frequencies, Wiley-Inlerscience, Chichester 1994, Ch. 18.
32. A. M. Wrobel, S. Wickramanayaka, Y. Nakanishi, Y. Fukuda, Y. Hatanaka, Chem. Mater. 1995, 7, 1403.
33. A. M. Wrobel, A. Walkiewicz-Pietrzykowska, J. E. Klemberg-Sapieha, Y. Nakanishi, T. Aoki, Y. Hatanaka, Chem. Mater. 2003, 15, 1749.
34. D. H. Zhang, Y. Gao, J. Wei, Z. O. Mo, Thin Solid Films 2000, 377- 378, 607.
35. K. B. Sundram, Z. Alizadeh, R. M. Todi, V. H. Desai, Mater. Sci. Eng. 2004, A368, 103.