Deposition of SiCN films using organic liquid materials by HWCVD method

Thin Solid Films

Volumn 501, Issue 1-2, 2006, Pages 195-197

  Izumi, Akira ^a   Oda, Koshi ^a  

^a KYUSHU INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Hexamethyldisilazane; SiCN; SiN

Indexed keywords

AMMONIA; CHEMICAL VAPOR DEPOSITION; COMPOSITION; DEPOSITION; ORGANIC COMPOUNDS; THIN FILMS;

HEXAMETHYLDISILAZANE; LIQUID MATERIAL; SICN; SIN;

SILICON COMPOUNDS;

EID: 32644454148     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.07.210     Document Type: Conference Paper

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