The effects of nitrogen profile and concentration on negative bias temperature instability of plasma enhanced atomic layer deposition HfO x Ny prepared by in situ nitridation

Journal of Applied Physics

Volumn 104, Issue 6, 2008, Pages

  Maeng, W J ^a   Kim, Hyungjun ^a  

^a Pohang University of Science and Technology (POSTECH)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 54749090088     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2978360     Document Type: Article

References (22)

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