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Volumn 17, Issue 12, 2008, Pages 2071-2074
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In situ surface oxide reduction with pulsed arc discharge for maximum adhesion of diamond-like carbon coatings
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Author keywords
Diamond like carbon; Filtered pulsed arc discharge; Plasma deposition
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Indexed keywords
ADHESION;
CARBIDES;
CARBON;
CAVITY RESONATORS;
CHEMICAL PROPERTIES;
CHEMICAL VAPOR DEPOSITION;
DIAMONDS;
DISCHARGE (FLUID MECHANICS);
ELECTRIC DISCHARGES;
ELECTRIC LOAD MANAGEMENT;
PLASMA DEPOSITION;
PLASMAS;
SILICON;
WELDS;
ADHESION PROPERTIES;
CARBIDE FORMATIONS;
CARBON PLASMAS;
DEPOSITION SYSTEMS;
DIAMOND-LIKE CARBON;
DIAMOND-LIKE CARBONS;
DLC COATINGS;
ELECTRON SPECTROSCOPY FOR CHEMICAL ANALYSES;
FILTERED PULSED ARC DISCHARGE;
FILTERED PULSED ARC DISCHARGES;
HIGH ADHESIONS;
HIGH ENERGIES;
HIGH QUALITIES;
HIGH-TEMPERATURE;
IN-SITU;
ION MIXING;
OXIDE REDUCTIONS;
PRACTICAL METHODS;
PULSED ARC DISCHARGES;
SILICON SUBSTRATES;
SUBSTRATE INTERFACES;
SURFACE OXIDE REDUCTIONS;
SUBSTRATES;
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EID: 54149090213
PISSN: 09259635
EISSN: None
Source Type: Journal
DOI: 10.1016/j.diamond.2008.07.013 Document Type: Article |
Times cited : (8)
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References (38)
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