메뉴 건너뛰기




Volumn 17, Issue 12, 2008, Pages 2071-2074

In situ surface oxide reduction with pulsed arc discharge for maximum adhesion of diamond-like carbon coatings

Author keywords

Diamond like carbon; Filtered pulsed arc discharge; Plasma deposition

Indexed keywords

ADHESION; CARBIDES; CARBON; CAVITY RESONATORS; CHEMICAL PROPERTIES; CHEMICAL VAPOR DEPOSITION; DIAMONDS; DISCHARGE (FLUID MECHANICS); ELECTRIC DISCHARGES; ELECTRIC LOAD MANAGEMENT; PLASMA DEPOSITION; PLASMAS; SILICON; WELDS;

EID: 54149090213     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2008.07.013     Document Type: Article
Times cited : (8)

References (38)
  • 5
    • 54149115488 scopus 로고    scopus 로고
    • A. Anttila, J.-P. Hirvonen, J. Koskinen, US Patent 5078848 (1992).
    • A. Anttila, J.-P. Hirvonen, J. Koskinen, US Patent 5078848 (1992).
  • 19
    • 54149104447 scopus 로고
    • Chastain J., and King Jr. R.C. (Eds), Eden Prairie, Minnesota
    • In: Chastain J., and King Jr. R.C. (Eds). Handbook of XPS, PHI (1995), Eden Prairie, Minnesota
    • (1995) Handbook of XPS, PHI


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.