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Volumn 15, Issue 10, 2006, Pages 1677-1681
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Effect of continuous in situ cathode polishing on plasma yield and energy in filtered pulsed arc discharge system
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Author keywords
Diamond like carbon; Plasma energy; Plasma yield; Pulsed arc discharge method
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Indexed keywords
CHEMICAL POLISHING;
DEPOSITION;
DIAMOND LIKE CARBON FILMS;
ELECTRIC DISCHARGES;
IONS;
PLASMA APPLICATIONS;
CATHODE MATERIAL;
PLASMA ENERGY;
PLASMA YIELD;
PULSED ARC DISCHARGE METHOD;
CATHODES;
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EID: 33748976903
PISSN: 09259635
EISSN: None
Source Type: Journal
DOI: 10.1016/j.diamond.2006.02.002 Document Type: Article |
Times cited : (3)
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References (22)
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