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Volumn 15, Issue 10, 2006, Pages 1677-1681

Effect of continuous in situ cathode polishing on plasma yield and energy in filtered pulsed arc discharge system

Author keywords

Diamond like carbon; Plasma energy; Plasma yield; Pulsed arc discharge method

Indexed keywords

CHEMICAL POLISHING; DEPOSITION; DIAMOND LIKE CARBON FILMS; ELECTRIC DISCHARGES; IONS; PLASMA APPLICATIONS;

EID: 33748976903     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2006.02.002     Document Type: Article
Times cited : (3)

References (22)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.