Superior attachment of high-quality hydrogen-free amorphous diamond films to solid materials

Advanced Materials

Volumn 9, Issue 15, 1997, Pages 1161-1164

  Anttila, Asko ^a   Lappalainen, Reijo ^a   Tiainen, Veli Matti ^a   Hakovirta, Marko ^a  

^a UNIVERSITY OF HELSINKI   (Finland)

Author keywords

[No Author keywords available]

Indexed keywords

ADHESION; AMORPHOUS FILMS; CHEMICAL VAPOR DEPOSITION; DELAMINATION; EVAPORATION; HARDNESS; PLASMA ACCELERATORS; RESIDUAL STRESSES; SILICON WAFERS; STRESS RELAXATION; SUBSTRATES;

HIGH ENERGY PLASMA BEAM; INTERMEDIATE LAYER TECHNIQUE; PLASMA ACCELERATION METHOD; SURFACE HARDNESS CONCEPT; VICKER HARDNESS; WHISKER COMPOSITE TECHNIQUE;

DIAMOND FILMS;

EID: 0031336524     PISSN: 09359648     EISSN: None     Source Type: Journal    
DOI: 10.1002/adma.19970091507     Document Type: Article

References (25)

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