Effect of ion implantation on DLC preparation using PBIID process

IEEE Transactions on Plasma Science

Volumn 34, Issue 4 I, 2006, Pages 1183-1189

  Oka, Yoshihiro ^a   Nishijima, Masahiko ^b   Hiraga, Kenji ^b   Yatsuzuka, Mitsuyasu ^a  

^a UNIVERSITY OF HYOGO   (Japan)

^b TOHOKU UNIVERSITY   (Japan)

Author keywords

Adhesion strength; Diamond like carbon (DLC); Ion implantation effect; Plasma based ion implantation and deposition (PBIID)

Indexed keywords

DIAMOND LIKE CARBON FILMS; ENERGY DISPERSIVE SPECTROSCOPY; PLASMA APPLICATIONS; RESIDUAL STRESSES; SCANNING ELECTRON MICROSCOPY; TRANSMISSION ELECTRON MICROSCOPY;

ADHESION STRENGTH; ION IMPLANTATION EFFECT; PLASMA-BASED ION IMPLANTATION AND DEPOSITION (PBIID);

ION IMPLANTATION;

EID: 33747838824     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/TPS.2006.878380     Document Type: Article

References (27)

1. J. Robertson, "Properties of diamond-like carbon," Surf. Coat. Technol., vol. 50, no. 3, pp. 185-203, Feb. 1992.
2. D. R. McKenzie, D. Muller, and B. A. Pailthorpe, "Compressive-stress-induced formation of thin-film tetrahedral amorphous carbon," Phys. Rev. Lett., vol. 67, no. 6, pp. 773-776, Aug. 1991.
3. P. J. Fallon, V. S. Veerasamy, C. A. Davis, J. Robertson, G. A. J. Amaratunga, W. I. Milne, and J. Koskinen, "Properties of filtered ion beam-deposited diamondlike carbon as a function of ion energy," Phys. Rev. B, Condens. Matter, vol. 48, no. 7, pp. 4777-4782, Aug. 1993.
4. C. A. Davis, "A simple model for the formation of compressive stress in thin films by ion bombardment," Thin Solid Films, vol. 226, no. 1, pp. 30-34, Apr. 1993.
5. J. W. Zou, K. Schmidt, K. Reichelt, and B. Stritzker, "The effect of heavy-ion bombardment on the properties of hard a-C:H (i-C) films," J. Vac. Sci. Technol. A, Vac. Surf. Films, vol. 6, no. 6, pp. 3103-3104, Nov. 1988.
6. M. M. M. Bilek, D. R. McKenzie, R. N. Tarrant, S. H. M. Lim, and D. G. McCloch, "Plasma-based ion implantation utilizing a cathodic arc plasma," Surf. Coat. Technol., vol. 156, no. 1-3, pp. 136-142, 2002.
7. M. M. M. Bilek, R. N. Tarrant, D. R. McKenzie, S. H. N. Lim, and D. G. McClloch, "Control of stress and microstructure in cathodic arc deposited films," IEEE Trans. Plasma Sci., vol. 31, no. 5, pp. 939-944, Oct. 2003.
8. Y. Oka, M. Tao, Y. Nishimura, K. Azuma, and M. Yatsuzuka, "Properties of thick DLC films prepared by plasma-based ion implantation and deposition," Nucl. Instrum. Methods Phys. Res. B, Beam Interact. Mater. At., vol. 206, no. 13, pp. 700-703, May 2003.
9. Y Oka, M. Kirinuki, Y. Nishimura, K. Azuma, E. Fujiwara, and M. Yatsuzuka, "Measurement of residual stress in DLC films prepared by plasma-based ion implantation and deposition," Surf. Coat. Technol., vol. 186, no. 1/2, pp. 141-145, Aug. 2004.
10. M. Kirinuki, Y. Oka, T. Utsumi, K. Azuma, E. Fujiwara, and M. Yatsuzuka, "Reduction of compressive residual stress of DLC film by plasma-based ion implantation," Nucl. Instrum. Methods Phys. Res. B, Beam Interact. Mater. At.. In press.
11. Y. Nishimura, A. Chayahara, Y. Horino, and M. Yatsuzuka, " new PBIID processing system supplying RF and HV pulses through a single feed-through," Surf. Coat. Technol., vol. 156, no. 1-3, pp. 50-53, Jul. 2002.
12. Y. Nishimura, R. Ohkawa, Y. Oka, H. Akamatusu, K. Azuma, and M. Yatsuzuka, "Uniform coating of thick DLC film on three-dimensional substrates," Nucl. Instrum. Methods Phys. Res. B, Beam Interact. Mater. At., vol. 203, no. 13, pp. 696-699, 2003.
13. Y. Oka, Y. Nishimura, and M. Yatsuzuka, "DLC coating of a few microns in thickness on three-dimensional substrates," Vacuum, vol. 73, no. 3/4, pp. 541-547, Apr. 2004.
14. M. Yatsuduka, Y. Oka, and Y. Nishimura, "Uniform thick DLC coating film on three-dimensional targets by PBII&D process using superimposed RF and high-voltage pulses," in Proc. 5th Int. Symp. Pulsed Power and Plasma Appl., 2004, pp. 97-103.
15. R. J. Adler and S. T. Picraux, "Repetitively pulsed metal ion beams for ion implantation," Nucl. Instrum. Methods Phys. Res. B, Beam Interact. Mater. At., vol. 6, no. 1/2, pp. 123-128, Jan. 1985.
16. J. R. Conrad, J. L. Radtke, R. A. Dodd, F. J. Worzala, and N. C. Tran, "Plasma source ion-implantation technique for surface modification of materials," J. Appl. Phys., vol. 62, no. 11, pp. 4591-4596, Dec. 1987.
17. K. C. Walter, M. Nastasi, and C. Munson, "Adherent diamond-like carbon coatings on metals via plasma source ion implantation," Surf. Coat. Technol., vol. 93, no. 2/3, pp. 287-291, Sep. 1997.
18. M. Kirinuki, A. Tomita, M. Kusuda, Y. Oka, A. Murakami, and M. Yatsuzuka, "Enhancement of adhesive strength of DLC film by plasma-based ion implantation," Mater Sci. Forum, vol. 502, pp. 315-320, 2005.
19. M. Yatsuzuka, Y. Oka, K. Nishikawa, Y. Nishimura, and E. Fujiwara, "High-adhesion, supra-thick DLC film coating on three-dimensional substrate by hybrid process of plasma-based ion implantation and deposition," in Proc. 4th Asia-Pacific Int. Symp. Basics and Appl. Plasma Sci. and Technol., 2005, pp. 343-348.
20. A. Tomita, M. Kusuda, S. Otsuki, Y. Oka, Y. Nishimura, A. Murakami, and M. Yatsuzuka, "Enhancement of adhesive strength of DLC film prepared by PBIID and Co-Cr alloy for biomaterial," Thin Solid Films, to be published.
21. L. Liu, A. Yamamoto, Y. Oka, M. Yatsuzuka, and H. Tsubakino, "Characteristics of diamond-like carbon film coated on pure aluminum," in Proc. 15th Eur. Conf. Diamond, Diamond-Like Mater., Carbon Nanotubes, Nitrides & Silicon Carbide, to be published.
22. 4 plasma," Nucl. Instr. Methods Phys. Res. B, to be published.
23. 3 bonding in tetrahedral amorphous carbon using ultraviolet Raman spectroscopy," Appl. Phys. Lett., vol. 70, no. 15, pp. 1980-1982, Apr. 1997.
24. A. C. Ferrari and J. Robertson, "Interpretation of Raman spectra of disordered and amorphous carbon," Phys. Rev. B, Condens. Matter, vol. 61, no. 20, pp. 14095-14107, May 2000.
25. M. Onoi, Y. Oka, E. Fujiwara, Y. Nishimura, K. Azuma, and M. Yatsuzuka, "Optical measurement of pulsed plasma produced by combined RF and H. V. pulses," Surf. Coat. Technol., vol. 186, no. 1/2, pp. 200-203, Aug. 2004.
26. J. N. Matossian and R. Wei, "Operating characteristics of a 100 kV, 100 kW plasma ion implantation facility," Surf. Coat. Technol., vol. 85, no. 1/2, pp. 92-97, Nov. 1996.
27. Handbook of Plasma Immersion Ion Implantation and Deposition, A. Anders, Ed. Hoboken, NJ: Wiley, 2000, p. 393.