Local anodic oxidation on dodecyl terminated silicon(100)

Superlattices and Microstructures

Volumn 44, Issue 4-5, 2008, Pages 402-410

  Graaf, Harald ^a   Baumgärtel, Thomas ^a   Vieluf, Maik ^a   von Borczyskowski, Christian ^a  

^a CHEMNITZ UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

AFM nanolithography; Alkyl terminated silicon(100); Local anodic oxidation (LAO)

Indexed keywords

CHEMICAL OXYGEN DEMAND; HYDROGEN; MICROSCOPIC EXAMINATION; OXIDATION; OXIDATION RESISTANCE; SILICON;

AFM NANOLITHOGRAPHY; ALKYL TERMINATED SILICON(100); AMBIENT CONDITIONS; APPLIED VOLTAGES; BI-EXPONENTIAL MODELS; DIRECT OXIDATION; LOCAL ANODIC OXIDATION; LOCAL ANODIC OXIDATION (LAO); LOCAL OXIDATION; OXIDATION OF HYDROGEN; OXIDATION PROCESSES; SCANNING PROBES;

ANODIC OXIDATION;

EID: 53749097949     PISSN: 07496036     EISSN: 10963677     Source Type: Journal    
DOI: 10.1016/j.spmi.2008.01.015     Document Type: Article

References (29)

1. Sugimura H., and Nakagiri N. Nanotechnology 8 (1997) A15
2. Maoz R., Cohen S.R., and Sagiv J. Adv. Mater. 11 (1999) 55
3. Linford M.R., Fenter P., Eisenberger P.M., and Chidsey C.E.D. J. Am. Chem. Soc. 117 (1995) 3145
4. Buriak J.M. Chem. Commun. (1999) 1051
5. Sieval A.B., Linke R., Zuilhof H., and Sudhoelter J.R. Adv. Mater. 12 (2000) 1457
6. Sung M.M., Kluth J., Yauw O.W., and Maboudian R. Langmuir 13 (1997) 6164
7. Sieval A.B., Demirel A.L., Nissink J.W.M., Linford M.R., van der Maas J.H., de Jeu W.H., Zuilhof H., and Sudhoelter E.J.R. Langmuir 14 (1998) 1759
8. Ara M., Graaf H., and Tada H. Appl. Phys. Lett. 80 (2002) 2565
9. Ara M., Graaf H., and Tada H. Jpn. J. Appl. Phys. 41 (2002) 4894
10. Graaf H., Vieluf M., and von Borczyskowski C. Nanotechnology 18 (2007) 265306
11. Ara M., Yamada R., and Tada H. Thin Solid Films 499 (2006) 8
12. Kuramochi H., Ando K., and Yokoyama H. Surf. Sci. 542 (2003) 56
13. Teuschler T., Mahr K., Miyazaki S., Hundhausen M., and Ley L. Appl. Phys. Lett. 67 (1995) 3144
14. Yang M., Zheng Z., Liu Y., and Zhang B. Nanotechnology 17 (2006) 330
15. Snow E.S., Jernigan G.G., and Campbell P.M. Appl. Phys. Lett. 76 (2000) 1782
16. Jungblut H., Wille D., and Lewerenz H.J. Appl. Phys. Lett. 78 (2001) 168
17. Metzger M., Reichert H., Schöder S., Okasinski J., Schröder H., Dosch H., Palms D., Ralston J., and Honkimäki V. Proc. Natl. Acad. Sci. 103 (2006) 18401
18. Pignataro B., Licciardello A., Cataldo S., and Marletta G. Mater. Sci. Eng. C 23 (2003) 7
19. Fontaine P.A., Dubois E., and Stievenard D. J. Appl. Phys. 84 (1998) 1776
20. Martin C., Rius G., Borrise X., and Perez-Murano F. Nanotechnology 16 (2005) 1016
21. Yang M., Zheng Z., Liu Y., and Zhang B. J. Phys. Chem. B 110 (2006) 10365
22. Wouters D., Willems R., Hoeppener S., and Flipse C.F.J. U.S. Schubert, Adv. Funct. Mater. 15 (2005) 938
23. Xie X.N., Chung H.J., Sow C.H., and Wee A.T.S. Chem. Phys. Lett. 388 (2004) 446
24. Kuramochi H., Perez-Murano F., Dagata J.A., and Yokoyama H. Nanotechnology 15 (2004) 297
25. Dagata J.A., Perez-Murano F., Martin C., Kuramochi H., and Yokoyama H. J. Appl. Phys. 96 (2004) 2386
26. Dagata J.A., Inoue T., Itoh J., and Yokoyama H. Appl. Phys. Lett. 73 (1998) 271
27. Avouris P., Hertel T., and Martel R. Appl. Phys. Lett. 71 (1997) 285
28. Dagata J.A., Perez-Murano F., Martin C., Kuramochi H., and Yokoyama H. J. Appl. Phys. 96 (2004) 2393
29. Dagata J.A., Perez-Murano F., Abadal G., Morimoto K., Inoue T., Itoh J., and Yokoyama H. Appl. Phys. Lett. 76 (2000) 2710