AFM lithography in constant current mode

Nanotechnology

Volumn 8, Issue 3 SUPPL. A, 1997, Pages

  Sugimura, Hiroyuki ^a,b   Nakagiri, Nobuyuki ^a  

^a NIKON CORPORATION   (Japan)

^b NAGOYA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CARRIER CONCENTRATION; DEGRADATION; ELECTROCHEMISTRY; MONOLAYERS; PHOTORESISTS; SEMICONDUCTING SILICON; SUBSTRATES;

CONSTANT CURRENT MODE;

NANOTECHNOLOGY;

EID: 0031234283     PISSN: 09574484     EISSN: None     Source Type: Journal    
DOI: 10.1088/0957-4484/8/3A/004     Document Type: Article

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