High-resolution in situ x-ray study of the hydrophobic gap at the water-octadecyl-trichlorosilane interface

Proceedings of the National Academy of Sciences of the United States of America

Volumn 103, Issue 49, 2006, Pages 18401-18404

  Mezger, Markus ^a   Reichert, Harald ^a   Schöder, Sebastian ^a,c   Okasinski, John ^a,c   Schröder, Helko ^a   Dosch, Helmut ^a,b   Palms, Dennis ^d   Ralston, John ^d   Honkimäki, Veijo ^c  

^a MAX PLANCK INSTITUTE FOR INTELLIGENT SYSTEMS   (Germany)

^b UNIVERSITY OF STUTTGART   (Germany)

^c EUROPEAN SYNCHROTRON RADIATION FACILITY   (France)

^d UNIVERSITY OF SOUTH AUSTRALIA   (Australia)

Author keywords

Hydrophobicity; Interfacial water; X ray reflectivity

Indexed keywords

ARGON; CARBON DIOXIDE; CARBON MONOXIDE; CHLORINE DERIVATIVE; KRYPTON; NITROGEN; OCTADECYLTRICHLOROSILANE; OXYGEN; SILANE DERIVATIVE; WATER; XENON;

ARTICLE; DENSITY; ENERGY; HYDROPHOBICITY; LIQUID; MEASUREMENT; PRIORITY JOURNAL; SOLID; X RAY;

EID: 33845498275     PISSN: 00278424     EISSN: None     Source Type: Journal    
DOI: 10.1073/pnas.0608827103     Document Type: Article

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