SiC cleaning method by use of dilute HCN aqueous solutions

Journal of the Electrochemical Society

Volumn 155, Issue 11, 2008, Pages

  Madani, Mohammad ^a   Liu, Yueh Ling ^a   Takahashi, Masao ^a   Iwasa, Hitoo ^a   Kobayashi, Hikaru ^a  

^a OSAKA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL CLEANING; CHEMICAL STABILITY; CHEMICALS REMOVAL (WATER TREATMENT); CHLORINE COMPOUNDS; CYANIDES; ELECTROLYSIS; HYDROGEN; IONS; METAL CLEANING; METALS; NONMETALS; SILICON CARBIDE; SOLUTIONS;

AQUEOUS SOLUTIONS; CHEMICAL-; COMPLEX IONS; CYANIDE IONS; HIGH REACTIVITY; HYDROGEN CYANIDE; METAL CONTAMINANTS; RCA CLEANING; REMOVAL PROCESSES;

METAL RECOVERY;

EID: 52649168963     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2976213     Document Type: Article

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