Surface mechanisms in homoepitaxlal growth on α-SIC {0001}-vicinal faces

Materials Science Forum

Volumn 457-460, Issue I, 2004, Pages 163-168

  Nakamura, Shun Ichi ^a   Kimoto, Tsunenobu ^a   Matsunami, Hiroyuki ^a  

^a KYOTO UNIVERSITY   (Japan)

Author keywords

Atomic Force Microscopy (AFM); Chemical Vapor Deposition (CVD); Homoepitaxial Growth; Surface Step Structures; 0001 vicinal Faces

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; CRYSTAL DEFECTS; CRYSTAL GROWTH; EPITAXIAL GROWTH; SURFACE STRUCTURE; SURFACE TREATMENT;

HOMOEPITAXIAL GROWTH; SPIRAL GROWTH; SURFACE STEP STRUCTURES; VICINAL FACES;

SILICON CARBIDE;

EID: 8744235006     PISSN: 02555476     EISSN: 16629752     Source Type: Book Series    
DOI: None     Document Type: Conference Paper

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