Plasma profiles of inductively coupled plasmas sustained with low-inductance internal antenna

Plasma Processes and Polymers

Volumn 4, Issue SUPPL.1, 2007, Pages

  Takenaka, Kosuke ^a   Sera, Takashi ^a   Ebe, Akinori ^b   Setsuhara, Yuichi ^a  

^a OSAKA UNIVERSITY   (Japan)

^b EMD Corporation   (Japan)

Author keywords

Antenna discharges; Internal antenna; Large area; Plasma source; Plasma treatment

Indexed keywords

DOWNSTREAM REGION; EFFECTIVE SUPPRESSION; ELECTROSTATIC COUPLING; FLOATING POTENTIALS; INTERNAL ANTENNA; INTERNAL ANTENNAS; LARGE-AREA; LOW-INDUCTANCE ANTENNA; PLASMA PROFILES; PLASMA PROPERTIES; PLASMA TREATMENT; RF VOLTAGE; RF-POWER; SINGLE ANTENNA;

ANTENNAS; ELECTRON TEMPERATURE; INDUCTANCE; INDUCTIVELY COUPLED PLASMA; PLASMA APPLICATIONS; PLASMA DENSITY; PLASMA JETS; PLASMA SOURCES;

ELECTRIC DISCHARGES;

EID: 50349090479     PISSN: 16128850     EISSN: 16128869     Source Type: Journal    
DOI: 10.1002/ppap.200732319     Document Type: Conference Paper

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