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Volumn 41, Issue 15, 2008, Pages

Buffer optimization for crack-free GaN epitaxial layers grown on Si(1 1 1) substrate by MOCVD

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; BUFFER LAYERS; CHEMICAL VAPOR DEPOSITION; COHERENT LIGHT; CRACKING (CHEMICAL); CRACKS; EMISSION SPECTROSCOPY; EPITAXIAL GROWTH; EPITAXIAL LAYERS; FULL WIDTH AT HALF MAXIMUM; GALLIUM NITRIDE; IMAGING TECHNIQUES; LIGHT; LIGHT EMISSION; LUMINESCENCE; MICROSCOPIC EXAMINATION; MOLECULAR BEAM EPITAXY; OPTICAL ENGINEERING; OPTICAL PROPERTIES; OPTICAL WAVEGUIDES; OPTIMIZATION; PHOTOLUMINESCENCE; SCANNING PROBE MICROSCOPY; SEMICONDUCTING ALUMINUM COMPOUNDS; SEMICONDUCTING CADMIUM TELLURIDE; SEMICONDUCTING GALLIUM; SEMICONDUCTING SILICON COMPOUNDS; SEMICONDUCTOR QUANTUM WELLS; SILICON; SINGLE CRYSTALS; X RAY ANALYSIS; X RAY DIFFRACTION ANALYSIS; ZINC SULFIDE;

EID: 49749117092     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/41/15/155317     Document Type: Article
Times cited : (115)

References (46)
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.