Electronic structure analysis of Zr silicate and Hf silicate films by using spatially resolved valence electron energy-loss spectroscopy

Journal of Applied Physics

Volumn 94, Issue 1, 2003, Pages 480-486

  Ikarashi, Nobuyuki ^a   Manabe, Kenzo ^a  

^a NEC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DIELECTRIC MATERIALS; ELECTRON ENERGY LOSS SPECTROSCOPY; ELECTRONIC STRUCTURE; HAFNIUM COMPOUNDS; LEAKAGE CURRENTS; SILICATES; ZIRCONIUM COMPOUNDS;

BAND GAPS;

THIN FILMS;

EID: 0041339893     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1580642     Document Type: Article

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