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Volumn 19, Issue 27, 2008, Pages

A high resolution water soluble fullerene molecular resist for electron beam lithography

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAMS; ELECTRON GUNS; ELECTRONICS INDUSTRY; FULLERENES; MICROELECTRONICS; NANOSTRUCTURES; PARTICLE BEAMS; SOLVENTS;

EID: 48249092065     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/19/27/275308     Document Type: Article
Times cited : (22)

References (24)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.