Effect of substrate bias on the plasma enhanced chemical vapor deposition of microcrystalline silicon thin films

Thin Solid Films

Volumn 516, Issue 20, 2008, Pages 6912-6918

  Zhang, X D ^b   Zhang, F R ^b   Amanatides, E ^a   Mataras, D ^a   Zhao, Y ^b  

^a UNIVERSITY OF PATRAS   (Greece)

^b NANKAI UNIVERSITY   (China)

Author keywords

Microcrystalline silicon; PECVD; Plasma diagnostics; Substrate bias

Indexed keywords

COATINGS; METALLIZING; MICROCRYSTALLINE SILICON; NONMETALS; PHOTOACOUSTIC EFFECT; PLASMA DEPOSITION; PLASMA DIAGNOSTICS; SILICON; SOLIDS; THICK FILMS; THIN FILMS; VAPOR DEPOSITION;

CHEMICAL VAPORS; SILICON THIN FILMS; SUBSTRATE BIAS VOLTAGE (VS); SUBSTRATE BIASING;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

EID: 45849117274     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.12.060     Document Type: Article

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