Ion bombardment effects on the microcrystalline silicon growth mechanisms and structure

Journal of Non-Crystalline Solids

Volumn 299-302, Issue PART 1, 2002, Pages 63-67

  Kalache, B ^a   Kosarev, A I ^a   Vanderhaghen, R ^a   Roca i Cabarrocas, P ^a  

^a LABORATOIRE DE PHYSIQUE DES INTERFACES ET DES COUCHES MINCES   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL GROWTH; CRYSTAL STRUCTURE; DEPOSITION; ION BOMBARDMENT; NUCLEATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PRESSURE EFFECTS; SEMICONDUCTING SILICON; SILANES; SUBSTRATES;

GLASS SUBSTRATES;

THIN FILMS;

EID: 0036538979     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-3093(01)00995-4     Document Type: Conference Paper

References (6)