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Volumn 45, Issue 2, 2004, Pages 404-408

Use of a neural network to characterize the surface roughness of a SiC film

Author keywords

Neural network; Plasma etching; Silicon carbide

Indexed keywords


EID: 4544275254     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article
Times cited : (4)

References (25)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.