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Volumn 45, Issue 2, 2004, Pages 404-408
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Use of a neural network to characterize the surface roughness of a SiC film
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Author keywords
Neural network; Plasma etching; Silicon carbide
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Indexed keywords
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EID: 4544275254
PISSN: 03744884
EISSN: None
Source Type: Journal
DOI: None Document Type: Article |
Times cited : (4)
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References (25)
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