Qualitative Interpretation of Etch Profile Nonuniformity Using a Wavelet and a Neural Network

Journal of the Korean Physical Society

Volumn 43, Issue 5 II, 2003, Pages 817-821

  Lee, Hak Sung ^a   Kim, Byungwhan ^a   Choi, Serk Rim ^a   Hong, Wan Shick ^a   Lee, Kyeong Kyun ^b   Choi, Won Sun ^c   Lim, Myo Taeg ^d  

^a Sejong University   (South Korea)

^b Korea Institute of Industrial Technology   (South Korea)

^c SAMSUNG Electronics   (South Korea)

^d Korea University   (South Korea)

Author keywords

Neural network; Plasma etching; Profile uniformity; Wavelet

Indexed keywords

EID: 0344551786     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: 10.3938/jkps.43.817     Document Type: Article

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